Tenfold increase in the photostability of an azobenzene guest in vapor-deposited glass mixtures

Qiu, Yue; Antony, Lucas W.; Torkelson, John M.; de Pablo, Juan J.; Ediger, M. D.

doi:10.1063/1.5052003

Title: Tenfold increase in the photostability of an azobenzene guest in vapor-deposited glass mixtures

Journal Article · Tue Nov 27 00:00:00 EST 2018 · Journal of Chemical Physics

DOI:https://doi.org/10.1063/1.5052003· OSTI ID:1610656

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Univ. of Wisconsin, Madison, WI (United States)
Univ. of Chicago, IL (United States)
Northwestern Univ., Evanston, IL (United States)

Improvements to the photostability of organic glasses for use in electronic applications have generally relied on the modification of the chemical structure. We show here that the photostability of a guest molecule can also be significantly improved—without chemical modification—by using physical vapor deposition to pack molecules more densely. Photoisomerization of the substituted azobenzene, 4,4'-diphenyl azobenzene, was studied in a vapor-deposited glass matrix of celecoxib. We directly measure photoisomerization of trans- to cis-states via Ultraviolet-visible (UV-Vis) spectroscopy and show that the rate of photoisomerization depends upon the substrate temperature used during co-deposition of the glass. Photostability correlates reasonably with the density of the glass, where the optimum glass is about tenfold more photostable than the liquid-cooled glass. Molecular simulations, which mimic photoisomerization, also demonstrate that photoreaction of a guest molecule can be suppressed in vapor-deposited glasses. Finally, from the simulations, we estimate that the region that is disrupted by a single photoisomerization event encompasses approximately 5 molecules.

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Research Organization:: Univ. of Wisconsin, Madison, WI (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES); US Army Research Office (ARO)

Grant/Contract Number:: SC0002161; W911NF-15-1-0568

OSTI ID:: 1610656

Journal Information:: Journal of Chemical Physics, Vol. 149, Issue 20; ISSN 0021-9606

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 13 works

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