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Title: Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices

Abstract

Surface morphology development and sputtering behavior of Cr, as a test material, have been explored under He plasma exposure at a low incident ion energy of ~80 eV in multiple linear plasma devices: PISCES-A, PSI-2, and NAGDIS-II. From comparison of the experiments in these devices, deposition of a small amount of heavier impurities (Mo in NAGDIS-II and Ta in PISCES-A) onto Cr is found to result in the formation of cone structures on the Cr surface due to preferential sputtering, resulting in a significant reduction (up to ~10 times) in the sputtering yield of Cr due to line-of-sight redeposition onto the neighboring cones. The heavier impurities are thought to originate from a sample holding cap/cover, which can be sputtered by a trace amount of intrinsic impurities (C, O, etc) as well as by Cr ionized in the plasma. It can be concluded from the Cr experiments, as well as additional Be data collected in PISCES-B, that heavier impurity deposition plays a major role in the cone structure formation, while other mechanisms (e.g. surface irregularity and oxide) also exist.

Authors:
 [1]; ORCiD logo [2];  [1]; ORCiD logo [2];  [3];  [4]; ORCiD logo [4];  [5];  [4];  [1];  [2];  [2];  [2];  [2];  [1]
  1. Univ. of California, San Diego, CA (United States)
  2. Forschungszentrum Juelich GmbH (Germany)
  3. Forschungszentrum Juelich GmbH (Germany); National Research Nuclear Univ. MEPhI, Moscow (Russia)
  4. Nagoya Univ. (Japan)
  5. Shimane Univ., Matsue (Japan)
Publication Date:
Research Org.:
Univ. of California, San Diego, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1609931
Grant/Contract Number:  
FG02-07ER54912
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Nuclear Materials and Energy
Additional Journal Information:
Journal Volume: 18; Journal Issue: C; Journal ID: ISSN 2352-1791
Publisher:
Elsevier
Country of Publication:
United States
Language:
English
Subject:
73 NUCLEAR PHYSICS AND RADIATION PHYSICS; 36 MATERIALS SCIENCE; Impurity deposition; Sputtering; Nanostructure

Citation Formats

Nishijima, D., Kreter, A., Baldwin, M. J., Borodin, D., Eksaeva, A., Hwangbo, D., Kajita, S., Miyamoto, M., Ohno, N., Patino, M., Pospieszczyk, A., Rasinski, M., Schlummer, T., Terra, A., and Doerner, R. P. Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices. United States: N. p., 2018. Web. doi:10.1016/j.nme.2018.12.008.
Nishijima, D., Kreter, A., Baldwin, M. J., Borodin, D., Eksaeva, A., Hwangbo, D., Kajita, S., Miyamoto, M., Ohno, N., Patino, M., Pospieszczyk, A., Rasinski, M., Schlummer, T., Terra, A., & Doerner, R. P. Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices. United States. doi:10.1016/j.nme.2018.12.008.
Nishijima, D., Kreter, A., Baldwin, M. J., Borodin, D., Eksaeva, A., Hwangbo, D., Kajita, S., Miyamoto, M., Ohno, N., Patino, M., Pospieszczyk, A., Rasinski, M., Schlummer, T., Terra, A., and Doerner, R. P. Tue . "Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices". United States. doi:10.1016/j.nme.2018.12.008. https://www.osti.gov/servlets/purl/1609931.
@article{osti_1609931,
title = {Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices},
author = {Nishijima, D. and Kreter, A. and Baldwin, M. J. and Borodin, D. and Eksaeva, A. and Hwangbo, D. and Kajita, S. and Miyamoto, M. and Ohno, N. and Patino, M. and Pospieszczyk, A. and Rasinski, M. and Schlummer, T. and Terra, A. and Doerner, R. P.},
abstractNote = {Surface morphology development and sputtering behavior of Cr, as a test material, have been explored under He plasma exposure at a low incident ion energy of ~80 eV in multiple linear plasma devices: PISCES-A, PSI-2, and NAGDIS-II. From comparison of the experiments in these devices, deposition of a small amount of heavier impurities (Mo in NAGDIS-II and Ta in PISCES-A) onto Cr is found to result in the formation of cone structures on the Cr surface due to preferential sputtering, resulting in a significant reduction (up to ~10 times) in the sputtering yield of Cr due to line-of-sight redeposition onto the neighboring cones. The heavier impurities are thought to originate from a sample holding cap/cover, which can be sputtered by a trace amount of intrinsic impurities (C, O, etc) as well as by Cr ionized in the plasma. It can be concluded from the Cr experiments, as well as additional Be data collected in PISCES-B, that heavier impurity deposition plays a major role in the cone structure formation, while other mechanisms (e.g. surface irregularity and oxide) also exist.},
doi = {10.1016/j.nme.2018.12.008},
journal = {Nuclear Materials and Energy},
issn = {2352-1791},
number = C,
volume = 18,
place = {United States},
year = {2018},
month = {12}
}

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