Cramming more components onto integrated circuits, Reprinted from Electronics, volume 38, number 8, April 19, 1965, pp.114 ff.
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September 2006 |
Impact of the vertical SOI 'DELTA' structure on planar device technology
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June 1991 |
High-performance fully depleted silicon nanowire (diameter /spl les/ 5 nm) gate-all-around CMOS devices
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May 2006 |
Atomic Layer Deposition: An Overview
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January 2010 |
Mechanism of Thermal Al 2 O 3 Atomic Layer Etching Using Sequential Reactions with Sn(acac) 2 and HF
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May 2015 |
Atomic Layer Etching of AlF 3 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac) 2 and Hydrogen Fluoride
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November 2015 |
Trimethylaluminum as the Metal Precursor for the Atomic Layer Etching of Al 2 O 3 Using Sequential, Self-Limiting Thermal Reactions
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April 2016 |
Atomic Layer Deposition of AlF 3 Using Trimethylaluminum and Hydrogen Fluoride
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June 2015 |
Thermal Atomic Layer Etching of Silicon Using O 2 , HF, and Al(CH 3 ) 3 as the Reactants
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November 2018 |
Thermal Atomic Layer Etching of SiO 2 by a “Conversion-Etch” Mechanism Using Sequential Reactions of Trimethylaluminum and Hydrogen Fluoride
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March 2017 |
Atomic Layer Etching of HfO 2 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac) 2 and HF
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January 2015 |
Thermal Atomic Layer Etching of ZnO by a “Conversion-Etch” Mechanism Using Sequential Exposures of Hydrogen Fluoride and Trimethylaluminum
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January 2017 |
Thermal Selective Vapor Etching of TiO 2 : Chemical Vapor Etching via WF 6 and Self-Limiting Atomic Layer Etching Using WF 6 and BCl 3
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August 2017 |
Thermal Atomic Layer Etching of Titanium Nitride Using Sequential, Self-Limiting Reactions: Oxidation to TiO 2 and Fluorination to Volatile TiF 4
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October 2017 |
WO 3 and W Thermal Atomic Layer Etching Using “Conversion-Fluorination” and “Oxidation-Conversion-Fluorination” Mechanisms
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April 2017 |
Prospects for Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions
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May 2016 |
Selectivity in Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions
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October 2016 |
Polymer thin films prepared by vapor deposition
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January 1994 |
Surface Chemistry for Molecular Layer Deposition of Organic and Hybrid Organic−Inorganic Polymers
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April 2009 |
Polymer films formed with monolayer growth steps by molecular layer deposition
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July 1991 |
Molecular Layer Deposition of Alucone Polymer Films Using Trimethylaluminum and Ethylene Glycol
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May 2008 |
Deposition of Organic- Inorganic Hybrid Materials by Atomic Layer Deposition
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January 2008 |
Molecular Layer Deposition of Hybrid Organic-Inorganic Polymer Films using Diethylzinc and Ethylene Glycol
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June 2009 |
Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques
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September 2012 |
Alucone Alloys with Tunable Properties Using Alucone Molecular Layer Deposition and Al 2 O 3 Atomic Layer Deposition
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February 2012 |
Gas diffusion barrier characteristics of Al2O3/alucone films formed using trimethylaluminum, water and ethylene glycol for organic light emitting diode encapsulation
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November 2013 |
Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition
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August 2002 |
Quartz Crystal Microbalance Studies of Al 2 O 3 Atomic Layer Deposition Using Trimethylaluminum and Water at 125 °C †
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January 2010 |
Mechanistic Study of Lithium Aluminum Oxide Atomic Layer Deposition
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January 2013 |
Vapor-Phase Atomic-Controllable Growth of Amorphous Li 2 S for High-Performance Lithium–Sulfur Batteries
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October 2014 |
Atomic Layer Deposition of Metal Fluorides Using HF–Pyridine as the Fluorine Precursor
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March 2016 |
Acidity measurements on pyridines in tetrahydrofuran using lithiated silylamines
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August 1985 |
Quantitative measure of .alpha.-silyl carbanion stabilization. The electron affinity of (trimethylsilyl)methyl radical
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December 1988 |
Hindered Brønsted bases as Lewis base catalysts
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January 2009 |
Molecular Hybrid Structures by Atomic Layer Deposition - Deposition of Alq 3 , Znq 2 and Tiq 4 (q = 8-hydroxyquinoline)
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May 2013 |
Atomic layer deposition of organic–inorganic hybrid materials based on saturated linear carboxylic acids
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January 2011 |
Nucleation and Growth during Al 2 O 3 Atomic Layer Deposition on Polymers
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November 2005 |
Modulation of the Growth Per Cycle in Atomic Layer Deposition Using Reversible Surface Functionalization
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December 2013 |
Tert-butyl alcohol—matrix i.r. spectra and vibrational assignment
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January 1978 |
A gas-phase Raman study of trimethylaluminium and trimethylboron monomers
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January 1971 |
Infrared matrix isolation spectroscopy of trimethylgallium, trimethylaluminium and triethylaluminium
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January 1984 |
Vibrational spectra of monomeric trimethylaluminium and trimethylgallium
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January 1991 |
New Insight into the Mechanism of Sequential Infiltration Synthesis from Infrared Spectroscopy
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October 2014 |
CH local modes in cyclobutene—I. FTIR studies 700–9000 cm−1
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January 1986 |
Slow Photoelectron Velocity-Map Imaging of the i -Methylvinoxide Anion †
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October 2010 |
Sequential Infiltration Synthesis of Electronic Materials: Group 13 Oxides via Metal Alkyl Precursors
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June 2019 |