Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene
Journal Article
·
· Nature Communications
- Univ. of Pennsylvania, Philadelphia, PA (United States); Chinese Univ. of Hong Kong, Shatin (Hong Kong)
- Univ. of California, Berkeley, CA (United States)
- Univ. of Pennsylvania, Philadelphia, PA (United States); Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Univ. of Pennsylvania, Philadelphia, PA (United States); Hong Kong Univ. of Science and Technology, Kowloon (Hong Kong)
- Univ. of Pennsylvania, Philadelphia, PA (United States)
- Univ. Paris-Saclay Saint-Aubin, Gif sur Yvette (France)
- Univ. of Pennsylvania, Philadelphia, PA (United States); City Univ. of Hong Kong, Kowloon (Hong Kong)
- Hong Kong Univ. of Science and Technology, Kowloon (Hong Kong)
- Materials Science Inst. of Madrid (ICMM) (Spain)
- Univ. of California, Berkeley, CA (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
The properties of van der Waals (vdW) materials often vary dramatically with the atomic stacking order between layers, but this order can be difficult to control. Trilayer graphene (TLG) stacks in either a semimetallic ABA or a semiconducting ABC configuration with a gate-tunable band gap, but the latter has only been produced by exfoliation. Here we present a chemical vapor deposition approach to TLG growth that yields greatly enhanced fraction and size of ABC domains. The key insight is that substrate curvature can stabilize ABC domains. Controllable ABC yields ~59% were achieved by tailoring substrate curvature levels. ABC fractions remained high after transfer to device substrates, as confirmed by transport measurements revealing the expected tunable ABC band gap. Substrate topography engineering provides a path to large-scale synthesis of epitaxial ABC-TLG and other vdW materials.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States); Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- German Research Council (DFG); National Science Foundation (NSF); USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- AC02-05CH11231; AC52-07NA27344; SC0012575
- OSTI ID:
- 1603611
- Alternate ID(s):
- OSTI ID: 1633022
- Report Number(s):
- LLNL-JRNL--802857; ark:/13030/qt6bd2b0db
- Journal Information:
- Nature Communications, Journal Name: Nature Communications Journal Issue: 1 Vol. 11; ISSN 2041-1723
- Publisher:
- Nature Publishing GroupCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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