Upgrade to the SHARP EUV mask microscope

Conference · Tue Jan 01 00:00:00 EST 2019

DOI:https://doi.org/10.1117/12.2516387· OSTI ID:1603504

Benk, M; Chao, W; Miyakawa, R; Goldberg, K; Naulleau, P

© 2019 SPIE. The Sharp High-NA Actinic Reticle review Project (SHARP) is a synchrotron-based, extreme ultraviolet (EUV) microscope dedicated to photomask research. A potential upgrade to the SHARP microscope is presented. The upgrade includes changing the light path in the instrument from its current off-Axis configuration to an on-Axis configuration. This change allows for an increased working distance of 2.5 mm or more. A central obscuration, added to the zoneplate aperture, blocks stray light from reaching the central part of the image, thus improving the image contrast. The imaging performance of the two configurations is evaluated by means of ray tracing.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: AC02-05CH11231
• OSTI ID: 1603504
• Resource Relation: Conference: Proceedings of SPIE - The International Society for Optical Engineering
• Country of Publication: United States
• Language: English