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Molecular Beam Epitaxy of Highly Crystalline Monolayer Molybdenum Disulfide on Hexagonal Boron Nitride

Journal Article · · Journal of the American Chemical Society
DOI:https://doi.org/10.1021/jacs.7b05131· OSTI ID:1597829
 [1];  [2];  [3];  [2];  [2];  [4];  [4];  [2];  [2];  [2];  [2];  [2];  [4];  [4];  [5];  [6];  [7]
  1. National Research Foundation (Singapore); National Univ. of Singapore (Singapore); Vanderbilt University
  2. National Univ. of Singapore (Singapore)
  3. University of Chinese Academy of Sciences, Beijing (China); Vanderbilt Univ., Nashville, TN (United States)
  4. Ulsan National Institute of Science and Technology (UNIST), Ulsan (Korea, Republic of)
  5. Vanderbilt Univ., Nashville, TN (United States)
  6. University of Chinese Academy of Sciences, Beijing (China); Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
  7. National Research Foundation (Singapore); National Univ. of Singapore (Singapore)
Atomically thin molybdenum disulfide (MoS2), a direct-band-gap semiconductor, is promising for applications in electronics and optoelectronics, but the scalable synthesis of highly crystalline film remains challenging. Here we report the successful epitaxial growth of a continuous, uniform, highly crystalline monolayer MoS2 film on hexagonal boron nitride (h-BN) by molecular beam epitaxy. Atomic force microscopy and electron microscopy studies reveal that MoS2 grown on h-BN primarily consists of two types of nucleation grains (0° aligned and 60° antialigned domains). By adopting a high growth temperature and ultralow precursor flux, the formation of 60° antialigned grains is largely suppressed. Further, the resulting perfectly aligned grains merge seamlessly into a highly crystalline film. Large-scale monolayer MoS2 film can be grown on a 2 in. h-BN/sapphire wafer, for which surface morphology and Raman mapping confirm good spatial uniformity. Our study represents a significant step in the scalable synthesis of highly crystalline MoS2 films on atomically flat surfaces and paves the way to large-scale applications.
Research Organization:
Vanderbilt Univ., Nashville, TN (United States)
Sponsoring Organization:
National Research Foundation; Singapore National Research Foundation (NRF); Chinese Academy of Science (CAS); McMinn Endowment; USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE); Ministry of Science, ICT and Future Planning (MSIT)
DOE Contract Number:
FG02-09ER46554
OSTI ID:
1597829
Journal Information:
Journal of the American Chemical Society, Journal Name: Journal of the American Chemical Society Journal Issue: 27 Vol. 139; ISSN 0002-7863
Publisher:
American Chemical Society (ACS)
Country of Publication:
United States
Language:
English

References (43)

Vapour phase growth and grain boundary structure of molybdenum disulphide atomic layers journal June 2013
Wafer-Scale and Wrinkle-Free Epitaxial Growth of Single-Orientated Multilayer Hexagonal Boron Nitride on Sapphire journal April 2016
Mobility engineering and a metal–insulator transition in monolayer MoS2 journal June 2013
Observation of piezoelectricity in free-standing monolayer MoS2 journal December 2014
Flexible metallic nanowires with self-adaptive contacts to semiconducting transition-metal dichalcogenide monolayers journal April 2014
Single-layer MoS2 transistors journal January 2011
The valley Hall effect in MoS2 transistors journal June 2014
Origin of Improved Optical Quality of Monolayer Molybdenum Disulfide Grown on Hexagonal Boron Nitride Substrate journal November 2015
Piezoelectricity of single-atomic-layer MoS2 for energy conversion and piezotronics journal October 2014
Grains and grain boundaries in highly crystalline monolayer molybdenum disulphide journal May 2013
Precisely Aligned Monolayer MoS 2 Epitaxially Grown on h-BN basal Plane journal December 2016
Synthesis of Large-Area MoS2 Atomic Layers with Chemical Vapor Deposition journal March 2012
Direct observation of the transition from indirect to direct bandgap in atomically thin epitaxial MoSe2 journal December 2013
Structural and electronic properties of h -BN journal September 2003
Direct Growth of Single- and Few-Layer MoS 2 on h-BN with Preferred Relative Rotation Angles journal September 2015
Epitaxial Monolayer MoS 2 on Mica with Novel Photoluminescence journal July 2013
Valley polarization in MoS2 monolayers by optical pumping journal June 2012
Gate-tunable memristive phenomena mediated by grain boundaries in single-layer MoS2 journal April 2015
Direct Growth of MoS 2 /h-BN Heterostructures via a Sulfide-Resistant Alloy journal January 2016
Phonon-limited mobility in n -type single-layer MoS 2 from first principles journal March 2012
Quasiparticle band structures and optical properties of strained monolayer MoS 2 and WS 2 journal April 2013
Multi-terminal transport measurements of MoS2 using a van der Waals heterostructure device platform journal April 2015
Intrinsic Electronic Transport Properties of High-Quality Monolayer and Bilayer MoS 2 journal August 2013
Oxygen-Assisted Chemical Vapor Deposition Growth of Large Single-Crystal and High-Quality Monolayer MoS 2 journal December 2015
Atomically Thin MoS2 A New Direct-Gap Semiconductor journal September 2010
Electrical Transport Properties of Polycrystalline Monolayer Molybdenum Disulfide journal July 2014
Quantitative measurement of displacement and strain fields from HREM micrographs journal August 1998
Chemical Vapor Deposition of High-Quality Large-Sized MoS 2 Crystals on Silicon Dioxide Substrates journal March 2016
Giant bandgap renormalization and excitonic effects in a monolayer transition metal dichalcogenide semiconductor journal August 2014
All Chemical Vapor Deposition Growth of MoS 2 :h-BN Vertical van der Waals Heterostructures journal April 2015
High yield exfoliation of two-dimensional chalcogenides using sodium naphthalenide journal January 2014
One-Dimensional Electrical Contact to a Two-Dimensional Material journal October 2013
Synthesis of large-area multilayer hexagonal boron nitride for high material performance journal October 2015
Large-Area Epitaxial Monolayer MoS 2 journal February 2015
Emerging Photoluminescence in Monolayer MoS2 journal April 2010
Growth of Large-Area and Highly Crystalline MoS2 Thin Layers on Insulating Substrates journal February 2012
Reliable Exfoliation of Large-Area High-Quality Flakes of Graphene and Other Two-Dimensional Materials journal September 2015
Intrinsic Structural Defects in Monolayer Molybdenum Disulfide journal May 2013
Metallic High-Angle Grain Boundaries in Monolayer Polycrystalline WS 2 journal June 2015
High-mobility three-atom-thick semiconducting films with wafer-scale homogeneity journal April 2015
From Bulk to Monolayer MoS2: Evolution of Raman Scattering journal January 2012
Molecular beam epitaxy growth of high quality p-doped SnS van der Waals epitaxy on a graphene buffer layer journal May 2012
Ultrasensitive photodetectors based on monolayer MoS2 journal June 2013