Molecular Beam Epitaxy of Highly Crystalline Monolayer Molybdenum Disulfide on Hexagonal Boron Nitride
Journal Article
·
· Journal of the American Chemical Society
- National Research Foundation (Singapore); National Univ. of Singapore (Singapore); Vanderbilt University
- National Univ. of Singapore (Singapore)
- University of Chinese Academy of Sciences, Beijing (China); Vanderbilt Univ., Nashville, TN (United States)
- Ulsan National Institute of Science and Technology (UNIST), Ulsan (Korea, Republic of)
- Vanderbilt Univ., Nashville, TN (United States)
- University of Chinese Academy of Sciences, Beijing (China); Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- National Research Foundation (Singapore); National Univ. of Singapore (Singapore)
Atomically thin molybdenum disulfide (MoS2), a direct-band-gap semiconductor, is promising for applications in electronics and optoelectronics, but the scalable synthesis of highly crystalline film remains challenging. Here we report the successful epitaxial growth of a continuous, uniform, highly crystalline monolayer MoS2 film on hexagonal boron nitride (h-BN) by molecular beam epitaxy. Atomic force microscopy and electron microscopy studies reveal that MoS2 grown on h-BN primarily consists of two types of nucleation grains (0° aligned and 60° antialigned domains). By adopting a high growth temperature and ultralow precursor flux, the formation of 60° antialigned grains is largely suppressed. Further, the resulting perfectly aligned grains merge seamlessly into a highly crystalline film. Large-scale monolayer MoS2 film can be grown on a 2 in. h-BN/sapphire wafer, for which surface morphology and Raman mapping confirm good spatial uniformity. Our study represents a significant step in the scalable synthesis of highly crystalline MoS2 films on atomically flat surfaces and paves the way to large-scale applications.
- Research Organization:
- Vanderbilt Univ., Nashville, TN (United States)
- Sponsoring Organization:
- National Research Foundation; Singapore National Research Foundation (NRF); Chinese Academy of Science (CAS); McMinn Endowment; USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE); Ministry of Science, ICT and Future Planning (MSIT)
- DOE Contract Number:
- FG02-09ER46554
- OSTI ID:
- 1597829
- Journal Information:
- Journal of the American Chemical Society, Journal Name: Journal of the American Chemical Society Journal Issue: 27 Vol. 139; ISSN 0002-7863
- Publisher:
- American Chemical Society (ACS)
- Country of Publication:
- United States
- Language:
- English
Similar Records
Towards Low-Temperature CVD Synthesis and Characterization of Mono- or Few-Layer Molybdenum Disulfide
Journal Article
·
Sun Sep 10 20:00:00 EDT 2023
· Micromachines
·
OSTI ID:2423992