Beating the thermodynamic limit with photo-activation of n-doping in organic semiconductors
- Princeton Univ., NJ (United States); Princeton University
- Helmholtz-Zentrum Berlin (HZB), (Germany). German Research Centre for Materials and Energy; Humboldt Univ. of Berlin (Germany)
- Princeton Univ., NJ (United States)
- Georgia Inst. of Technology, Atlanta, GA (United States)
Chemical doping of organic semiconductors using molecular dopants plays a key role in the fabrication of efficient organic electronic devices. While a variety of stable molecular p-dopants have been developed and successfully deployed in devices in the past decade, air-stable molecular n-dopants suitable for materials with low electron affinity are still elusive. In this work we demonstrate that photo-activation of a cleavable air-stable dimeric dopant can result in kinetically stable and efficient n-doping of host semiconductors, whose reduction potentials are beyond the thermodynamic reach of the dimer’s effective reducing strength. Electron-transport layers doped in this manner are used to fabricate high-efficiency organic light-emitting diodes. This strategy thus enables a new paradigm for using air-stable molecular dopants to improve conductivity in, and provide ohmic contacts to, organic semiconductors with very low electron affinity.
- Research Organization:
- Princeton Univ., NJ (United States)
- Sponsoring Organization:
- National Science Foundation (NSF); USDOE Office of Energy Efficiency and Renewable Energy (EERE), Building Technologies Office (EE-5B); USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22). Materials Sciences & Engineering Division
- Grant/Contract Number:
- EE0006672; SC0012458
- OSTI ID:
- 1595457
- Alternate ID(s):
- OSTI ID: 1539786
- Journal Information:
- Nature Materials, Journal Name: Nature Materials Journal Issue: 12 Vol. 16; ISSN 1476-1122
- Publisher:
- Springer Nature - Nature Publishing GroupCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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