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Electrochemical Roughening of Thin-Film Platinum Macro and Microelectrodes

Journal Article · · Journal of Visualized Experiments
DOI:https://doi.org/10.3791/59553· OSTI ID:1593564
This protocol demonstrates a method for electrochemical roughening of thin-film platinum electrodes without preferential dissolution at grain boundaries of the metal. Using this method, a crack free, thin-film macroelectrode surface with up to 40 times increase in active surface area was obtained. The roughening is easy to do in a standard electrochemical characterization laboratory and incudes the application of voltage pulses followed by extended application of a reductive voltage in a perchloric acid solution. The protocol includes the chemical and electrochemical preparation of both a macroscale (1.2 mm diameter) and microscale (20 µm diameter) platinum disc electrode surface, roughening the electrode surface and characterizing the effects of surface roughening on electrode active surface area. This electrochemical characterization includes cyclic voltammetry and impedance spectroscopy and is demonstrated for both the macroelectrodes and the microelectrodes. Finally, roughening increases electrode active surface area, decreases electrode impedance, increases platinum charge injection limits to those of titanium nitride electrodes of same geometry and improves substrates for adhesion of electrochemically deposited films.
Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
Grant/Contract Number:
AC52-07NA27344
OSTI ID:
1593564
Report Number(s):
LLNL-JRNL--762701; 951592
Journal Information:
Journal of Visualized Experiments, Journal Name: Journal of Visualized Experiments Vol. 148; ISSN 1940-087X
Publisher:
MyJoVE Corp.Copyright Statement
Country of Publication:
United States
Language:
English