Tuning two-dimensional phase formation through epitaxial strain and growth conditions: silica and silicate on Ni x Pd 1−x (111) alloy substrates
- Department of Mechanical Engineering and Materials Science, Yale University, New Haven, USA
- Department of Applied Physics, Yale University, New Haven, USA
- Department of Chemical and Environmental Engineering, Yale University, New Haven, USA
- Department of Applied Physics, Yale University, New Haven, USA, Energy Sciences Institute
- Department of Mechanical Engineering and Materials Science, Yale University, New Haven, USA, Department of Chemical and Environmental Engineering
- Department of Mechanical Engineering and Materials Science, Yale University, New Haven, USA, Department of Applied Physics
The combined experimental and theoretical results demonstrate the manipulation of 2D VDW silica and 2D Ni silicate through growth conditions, and the determination of the maximum epitaxial strain imparted to the 2D system through alloy substrate.
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- SC0012704; SC0014414
- OSTI ID:
- 1572588
- Journal Information:
- Nanoscale, Journal Name: Nanoscale Vol. 11 Journal Issue: 44; ISSN 2040-3364
- Publisher:
- Royal Society of Chemistry (RSC)Copyright Statement
- Country of Publication:
- United Kingdom
- Language:
- English
Cited by: 8 works
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