Deposition of Colloidal Particles during the Evaporation of Sessile Drops: Dilute Colloidal Dispersions
- Davidson School of Chemical Engineering, Purdue University, West Lafayette, Indiana, USA
The deposition of colloidal silica particles during the evaporation of sessile drops on a smooth substrate has been modeled by the simultaneous solution of the Navier–Stokes equations, the convective-diffusive equation for particles, and the diffusion equation for evaporated vapor in the gas phase. Isothermal conditions were assumed. A mapping was created to show the conditions for various deposition patterns for very dilute suspensions. Based on values of the Peclet (Pe) number and Damkholer numbers (Da and Da −1 ), the effects of adsorption and desorption were discussed according to the map. Simulations were also done for suspensions with a high particle concentration to form a solid phase during the evaporation by using a packing criterion. The simulations predicted the height and width of the ring deposit near the contact line, and the results compared favorably to experimental particle deposition patterns.
- Research Organization:
- Univ. of Maryland, College Park, MD (United States); Purdue Univ., West Lafayette, IN (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- DEFG02-02-ER45975; DEFG02-02-ER45976; FG02-02ER45975; FG02-02ER45976
- OSTI ID:
- 1569104
- Alternate ID(s):
- OSTI ID: 1800055
- Journal Information:
- International Journal of Chemical Engineering, Journal Name: International Journal of Chemical Engineering Vol. 2019; ISSN 1687-806X
- Publisher:
- Hindawi Publishing CorporationCopyright Statement
- Country of Publication:
- Egypt
- Language:
- English
Web of Science
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