Selective growth of Al2O3 on size-selected platinum clusters by atomic layer deposition

Gorey, Timothy J.; Dai, Yang; Anderson, Scott L.; Lee, Sungsik; Lee, Sungwon; Seifert, Soenke; Winans, Randall E.

doi:10.1016/j.susc.2019.121485

Title: Selective growth of Al₂O₃ on size-selected platinum clusters by atomic layer deposition

Journal Article · Sat Sep 14 00:00:00 EDT 2019 · Surface Science

DOI:https://doi.org/10.1016/j.susc.2019.121485· OSTI ID:1568770

Gorey, Timothy J. ^[1]; Dai, Yang ^[1]; Anderson, Scott L. ^[1]; Lee, Sungsik ^[2]; Lee, Sungwon ^[2]; Seifert, Soenke ^[2]; Winans, Randall E. ^[2]

Univ. of Utah, Salt Lake City, UT (United States)
Argonne National Lab. (ANL), Argonne, IL (United States)

In heterogeneous catalysis, atomic layer deposition (ALD) has been developed as a tool to stabilize and reduce carbon deposition on supported nanoparticles. Here, we discuss use of high vacuum ALD to deposit alumina films on size-selected, sub-nanometer Pt/SiO₂ model catalysts. Mass-selected Pt₂₄ clusters were deposited on oxidized Si(100), to form model Pt₂₄/SiO₂ catalysts with particles shown to be just under 1 nm, with multilayer three dimensional structure. Alternating exposures to trimethylaluminum and water vapor in an ultra-high vacuum chamber were used to grow alumina on the samples without exposing them to air. Here, the samples were probed in situ using X-ray photoelectron spectroscopy (XPS), low-energy ion scattering spectroscopy (ISS), and CO temperature-programmed desorption (TPD). Additional samples were prepared for ex situ experiments using grazing incidence small angle xray scattering spectroscopy (GISAXS). Alumina growth is found to initiate at least 60 times more efficiently at the Pt₂₄ cluster sites, compared to bare SiO₂/Si, with a single ALD cycle depositing a full alumina layer on top of the clusters, with substantial additional alumina growth initiating on SiO₂ sites surrounding the clusters. As a result, the clusters were completely passivated, with no exposed Pt binding sites.

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Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States)

Sponsoring Organization:: USDOE Office of Science (SC); Air Force Research Laboratory (AFRL), Air Force Office of Scientific Research (AFOSR)

Grant/Contract Number:: AC02-06CH11357; FA9550-16-1-0141; FA9550-19-1-0261

OSTI ID:: 1568770

Alternate ID(s):: OSTI ID: 1567910

Journal Information:: Surface Science, Vol. 691, Issue C; ISSN 0039-6028

Publisher:: ElsevierCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 10 works

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Sn-modification of Pt ₇ /alumina model catalysts: Suppression of carbon deposition and enhanced thermal stability Li, Guangjing; Zandkarimi, Borna; Cass, Ashley C. The Journal of Chemical Physics, Vol. 152, Issue 2 https://doi.org/10.1063/1.5129686	journal	January 2020
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Data for: Selective Growth of Al2O3 on Size-Selected Platinum Clusters by Atomic Layer Deposition Anderson, Scott https://doi.org/10.17632/w5kgj6drpv.1 The current record is supplemented by this dataset	dataset	January 2019
Data for: Selective Growth of Al2O3 on Size-Selected Platinum Clusters by Atomic Layer Deposition Anderson, Scott https://doi.org/10.17632/w5kgj6drpv The current record is supplemented by this dataset	dataset	January 2019

Title: Selective growth of Al2O3 on size-selected platinum clusters by atomic layer deposition

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Title: Selective growth of Al₂O₃ on size-selected platinum clusters by atomic layer deposition