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Title: Arc plasma-generating systems and methods thereof

Abstract

The present invention relates to systems for generating an arc fault in an electrical circuit, as well as methods thereof. In particular, the system provides a platform that can produce an arc discharge in a controlled manner, while measuring various parameters to characterize that discharge. Such parameters include voltage measurements, current measurements, optical spectroscopy measurements, electron temperatures, and/or plasma temperatures.

Inventors:
; ; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1568206
Patent Number(s):
10,261,120
Application Number:
15/603,782
Assignee:
National Technology & Engineering Solutions of Sandia, LLC (Albuquerque, NM)
DOE Contract Number:  
NA0003525
Resource Type:
Patent
Resource Relation:
Patent File Date: 05/24/2017
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Schindelholz, Eric John, Armijo, Kenneth Miguel, Johnson, Jay, Harrison, Richard Karl, and Yang, Benjamin Bing-Yeh. Arc plasma-generating systems and methods thereof. United States: N. p., 2019. Web.
Schindelholz, Eric John, Armijo, Kenneth Miguel, Johnson, Jay, Harrison, Richard Karl, & Yang, Benjamin Bing-Yeh. Arc plasma-generating systems and methods thereof. United States.
Schindelholz, Eric John, Armijo, Kenneth Miguel, Johnson, Jay, Harrison, Richard Karl, and Yang, Benjamin Bing-Yeh. Tue . "Arc plasma-generating systems and methods thereof". United States. https://www.osti.gov/servlets/purl/1568206.
@article{osti_1568206,
title = {Arc plasma-generating systems and methods thereof},
author = {Schindelholz, Eric John and Armijo, Kenneth Miguel and Johnson, Jay and Harrison, Richard Karl and Yang, Benjamin Bing-Yeh},
abstractNote = {The present invention relates to systems for generating an arc fault in an electrical circuit, as well as methods thereof. In particular, the system provides a platform that can produce an arc discharge in a controlled manner, while measuring various parameters to characterize that discharge. Such parameters include voltage measurements, current measurements, optical spectroscopy measurements, electron temperatures, and/or plasma temperatures.},
doi = {},
url = {https://www.osti.gov/biblio/1568206}, journal = {},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {4}
}

Patent:

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