skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Visualization of Kirkendall Voids at Cu-Au Interfaces by In Situ TEM Heating Studies

Journal Article · · JOM. Journal of the Minerals, Metals & Materials Society

Gold-plated copper alloys are used extensively in electrical contacts where diffusional processes are known to cause contact degradation. An in situ transmission electron microscopy (TEM) heating study was carried out to provide fundamental understanding of the aging phenomena in reasonable timescales. Samples to visualize the interface in TEM were prepared by focused ion beam (FIB) microscopy and heated in situ up to 350°C while holding at intermediate temperatures to enable imaging. The grain boundaries in Au coatings, specifically the columnar boundaries, provided rapid pathways for diffusion of Cu all the way to the Au surface. This unequal diffusion created vacancies in Cu which coalesced into Kirkendall voids. This in situ technique has been applied to visualize the diffusion pathways in electroplated and sputtered Au films deposited directly on Cu, as well the role of Ni and NiP as barrier layers for mitigating Cu diffusion.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
Grant/Contract Number:
AC04-94AL85000
OSTI ID:
1559505
Report Number(s):
SAND2019-8951J; 678064; TRN: US2000352
Journal Information:
JOM. Journal of the Minerals, Metals & Materials Society, Journal Name: JOM. Journal of the Minerals, Metals & Materials Society; ISSN 1047-4838
Publisher:
SpringerCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 5 works
Citation information provided by
Web of Science

References (24)

Quantitative analysis for in situ sintering of 3% yttria-stablized zirconia in the transmission electron microscope journal May 2015
Low‐temperature diffusion of copper through gold journal September 1976
Analysis of grain‐boundary diffusion in thin films: Chromium in gold journal September 1976
Interdiffusion in the CuAu thin film system at 25°C to 250°C journal March 1977
In situ TEM sintering of nano-sized ZrO2 particles journal December 1995
Potential and problems of high-temperature electronics and CMOS integrated circuits (25–250°C) - an overview journal April 1991
Grain growth mechanisms in ultrafine-grained steel: an electron backscatter diffraction and in situ TEM study journal April 2019
What limits the application of TEM in the semiconductor industry? journal May 1998
Diffusion-related behaviour of gold in thin film systems journal June 1979
Special aspects of diffusion in thin films journal February 1975
Automated Analysis of SEM X-Ray Spectral Images: A Powerful New Microanalysis Tool journal January 2003
Tribological Properties of Gold for Electric Contacts journal March 1973
Current and future uses of gold in electronics journal March 2002
Grain boundary diffusivity of Ni in Au thin films and the associated degradation in electrical contact resistance due to surface oxide film formation journal March 2013
Qualitative observations on the diffusion of copper and gold through a nickel barrier journal May 1976
Synthesis of Au–MoS 2 Nanocomposites: Thermal and Friction-Induced Changes to the Structure journal November 2013
A pyramid approach to subpixel registration based on intensity journal January 1998
Diffusion of iron, cobalt and nickel in gold journal January 1963
High-resolution and in situ tem studies of annealing of Ti-Si multilayers journal June 1988
Introduction to Focused Ion Beams book January 2005
Constriction resistance and the real area of contact journal December 1966
Ni-P (nickel-phosphorus) journal March 2000
Ni-P (Nickel-Phosphorus) journal January 2010
Qualitative observations on the diffusion of copper and gold through a nickel barrier journal April 1976

Similar Records

In situ liquid cell TEM reveals bridge-induced contact and fusion of Au nanocrystals in aqueous solution
Journal Article · Wed Oct 10 00:00:00 EDT 2018 · Nano Letters · OSTI ID:1559505

In situ visualization of metallurgical reactions in nanoscale Cu/Sn diffusion couples
Journal Article · Tue Feb 10 00:00:00 EST 2015 · Nanoscale · OSTI ID:1559505

Effects of residual impurities in electroplated Cu on the Kirkendall void formation during soldering
Journal Article · Mon Mar 03 00:00:00 EST 2008 · Applied Physics Letters · OSTI ID:1559505

Related Subjects