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Front/Back Poly-Si/SiO2 Passivated Contact Device with Voc > 720 mV

Conference ·
We report on front/back poly-Si/SiO2 passivated contact solar cells with iVoc > 735 mV and Voc > 720 mV. The devices were grown on n-Cz wafers using PECVD to deposit doped a-Si layers which were then annealed at 850 degrees C. Our best device has an efficiency of 21% which is limited by: (1) low current density from a large grid shadow loss and parasitic absorption in the front poly-Si:P layer; and (2) high series resistance from a high Al-poly-Si:P contact resistivity. We discuss the role of high temperature anneals throughout the process flow to preserve and improve the bulk lifetime of the n-Cz wafers.
Research Organization:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
Sponsoring Organization:
USDOE Office of Energy Efficiency and Renewable Energy (EERE), Solar Energy Technologies Office (EE-4S)
DOE Contract Number:
AC36-08GO28308
OSTI ID:
1558345
Report Number(s):
NREL/CP-5900-72446
Country of Publication:
United States
Language:
English