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Title: Growth of 2H stacked WSe 2 bilayers on sapphire

Journal Article · · Nanoscale Horizons
DOI:https://doi.org/10.1039/C9NH00260J· OSTI ID:1545170
 [1];  [1];  [2];  [1];  [1];  [1]; ORCiD logo [3];  [1];  [4];  [1]; ORCiD logo [1];  [5]; ORCiD logo [1];  [6]; ORCiD logo [1]; ORCiD logo [4]
  1. Physical Sciences and Engineering Division (PSE), King Abdullah University of Science and Technology, Thuwal 23955-6900, Kingdom of Saudi Arabia
  2. Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore
  3. King Abdullah University of Science and Technology (KAUST), Thuwal, Kingdom of Saudi Arabia
  4. Physical Sciences and Engineering Division (PSE), King Abdullah University of Science and Technology, Thuwal 23955-6900, Kingdom of Saudi Arabia, School of Materials Science and Engineering
  5. Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, MajuLab
  6. Physical Sciences and Engineering Division (PSE), King Abdullah University of Science and Technology, Thuwal 23955-6900, Kingdom of Saudi Arabia, Molecular Foundry Division

Bilayers of two-dimensional (2D) transition metal chalcogenides (TMDs) such as WSe2 have been attracting increasing attention owing to the intriguing properties involved in the different stacking configurations. The growth of bilayer WSe2 by chemical vapor deposition (CVD) has been facilely obtained without proper control of the stacking configuration. Herein, we report the controlled growth of bilayer WSe2 crystals as large as 30 μm on c-plane sapphire by the CVD method. Combining second harmonic generation (SHG), low-frequency Raman and scanning transmission electron microscopy (STEM), we elucidate the as-grown bilayer WSe2 with a 2H stacking configuration. Atomic force microscope (AFM) measurements reveal that the prominent atomic steps provide the energetically favorable templates to guide the upper layer nuclei formation, resembling the “graphoepitaxial effect” and facilitating the second WSe2 layer following the layer-by-layer growth mode to complete the bilayer growth. Field-effect charge transport measurement performed on bilayer WSe2 yields a hole mobility of up to 40 cm2 V–1 s–1, more than 3× higher than the value achieved in monolayer WSe2-based devices. Our study provides key insights into the growth mechanism of bilayer WSe2 crystals on sapphire and unlocks the opportunity for potential bilayer and multilayer TMD electronic applications.

Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
AC02-05CH11231
OSTI ID:
1545170
Alternate ID(s):
OSTI ID: 1757959
Journal Information:
Nanoscale Horizons, Journal Name: Nanoscale Horizons Vol. 4 Journal Issue: 6; ISSN 2055-6756
Publisher:
Royal Society of ChemistryCopyright Statement
Country of Publication:
United Kingdom
Language:
English
Citation Metrics:
Cited by: 16 works
Citation information provided by
Web of Science

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