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Title: Symmetry breaking in high frequency, symmetric capacitively coupled plasmas

Journal Article · · Physics of Plasmas
DOI:https://doi.org/10.1063/1.5048947· OSTI ID:1540256

Two radially propagating surface wave modes, “symmetric,” in which the upper and lower axial sheath fields (Ez) are aligned, and “anti-symmetric,” in which they are opposed, can exist in capacitively coupled plasma (CCP) discharges. For a symmetric (equal electrode areas) CCP driven symmetrically, we expected to observe only the symmetric mode. Instead, we find that when the applied rf frequency f is above or near an anti-symmetric spatial resonance, both modes can exist in combination and lead to unexpected non-symmetric equilibria. We use a fast 2D axisymmetric fluid-analytical code to study a symmetric CCP reactor at low pressure (7.5 mTorr argon) and low density (~3 × 1015 m-3) in the frequency range of f = 55 to 100 MHz which encompasses the first anti-symmetric spatial resonance frequency fa but is far below the first symmetric spatial resonance fs. For lower frequencies such that f is well below fa>, the symmetric CCP is in a stable symmetric equilibrium, as expected, but at higher frequencies such that f is near or greater than fa, a non-symmetric equilibrium appears which may be stable or unstable. In our study, we develop a nonlinear lumped circuit model of the symmetric CCP to better understand these unexpected results, indicating that the proximity to the anti-symmetric spatial resonance allows self-exciting of the anti-symmetric mode even in a symmetric system. The circuit model results agree well with the fluid simulations. A linear stability analysis of the symmetric equilibrium describes a transition with increasing frequency from stable to unstable.

Research Organization:
Univ. of Michigan, Ann Arbor, MI (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
Grant/Contract Number:
SC0001939
OSTI ID:
1540256
Alternate ID(s):
OSTI ID: 1472211
Journal Information:
Physics of Plasmas, Vol. 25, Issue 9; ISSN 1070-664X
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 12 works
Citation information provided by
Web of Science

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  • Kawamura, Emi; Wen, De-Qi; Lieberman, Michael A.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 35, Issue 5 https://doi.org/10.1116/1.4993595
journal September 2017
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