Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features

Journal Article · Fri Sep 01 00:00:00 EDT 2017 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

DOI:https://doi.org/10.1116/1.4973953· OSTI ID:1536816

Huard, Chad M. ^[1]; Zhang, Yiting ^[2]; Sriraman, Saravanapriyan ^[2]; Paterson, Alex ^[2]; Kushner, Mark J. ^[1]

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1. Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave., Ann Arbor, Michigan 48109-2122
2. Lam Research Corp., 4650 Cushing Parkway, Fremont, California 94538

Not provided.

• Research Organization: Univ. of Michigan, Ann Arbor, MI (United States)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: SC0014132
• OSTI ID: 1536816
• Journal Information: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 35, Issue 5; ISSN 0734-2101
• Publisher: American Vacuum Society
• Country of Publication: United States
• Language: English

Related Subjects

Materials Science
Physics