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Title: Interfacial Charge Engineering in Ferroelectric-Controlled Mott Transistors

Journal Article · · Advanced Materials
 [1];  [1];  [2];  [3];  [1];  [1];  [2];  [1]; ORCiD logo [1]
  1. Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln NE 68588-0299 USA
  2. Department of Mechanical and Materials Engineering & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln NE 68588-0526 USA
  3. Department of Physics, Columbia University, New York NY 10027 USA; New York University Shanghai, Shanghai 200122 China; NYU-ECNU Institute of Physics, New York University Shanghai, Shanghai 200062 China; Department of Physics, New York University, New York NY 10002 USA

Not provided.

Research Organization:
Univ. of Nebraska, Lincoln, NE (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
DOE Contract Number:
SC0016153
OSTI ID:
1533042
Journal Information:
Advanced Materials, Vol. 29, Issue 31; ISSN 0935-9648
Publisher:
Wiley
Country of Publication:
United States
Language:
English

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Cited By (7)

Tailoring Materials for Mottronics: Excess Oxygen Doping of a Prototypical Mott Insulator journal May 2018
Conductive Oxide Interfaces for Field Effect Devices journal June 2019
Ferroelectric phase transition induced relaxation of electroresistance in La 0.67 Sr 0.33 MnO 3 /BaTiO 3 heterostructures journal April 2019
Mechanism analysis of a flexible organic memristive memory with capacitance effect and negative differential resistance state journal August 2019
Polarization Orientation in Lead Zirconate Titanate (001) Thin Films Driven by the Interface with the Substrate journal September 2018
Epitaxial growth of perovskite (111) 0.65PMN-0.35PT films directly on wurtzite GaN (0002) surface journal June 2018
Rare-earth nickelates R NiO 3 : thin films and heterostructures journal February 2018

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