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Title: Method of using a germanium layer transfer to Si for photovoltaic applications and heterostructure made thereby

Patent ·
OSTI ID:1531507

Ge/Si and other nonsilicon film heterostructures are formed by hydrogen-induced exfoliation of the Ge film which is wafer bonded to a cheaper substrate, such as Si. A thin, single-crystal layer of Ge is transferred to Si substrate. The bond at the interface of the Ge/Si heterostructures is covalent to ensure good thermal contact, mechanical strength, and to enable the formation of an ohmic contact between the Si substrate and Ge layers. To accomplish this type of bond, hydrophobic wafer bonding is used, because as the invention demonstrates the hydrogen-surface-terminating species that facilitate van der Waals bonding evolves at temperatures above 600° C. into covalent bonding in hydrophobically bound Ge/Si layer transferred systems.

Research Organization:
California Institute of Technology (CalTech), Pasadena, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
ACQ-1-30619-13
Assignee:
California Institute of Technology (Pasadena, CA)
Patent Number(s):
7,019,339
Application Number:
10/125,133
OSTI ID:
1531507
Resource Relation:
Patent File Date: 2002-04-17
Country of Publication:
United States
Language:
English

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