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Fabrication of photonic band gap materials using microtransfer molded templates

Patent ·
OSTI ID:1531455

A method of manufacturing photonic band gap structures operable in the optical spectrum has been presented. The method comprises the steps of creating a patterned template for an elastomeric mold, fabricating an elastomeric mold from poly-dimethylsiloxane (PDMS) or other suitable polymer, filling the elastomeric mold with a second polymer such as epoxy or other suitable polymer, stamping the second polymer by making contact with a substrate or multilayer structure, removing the elastomeric mold, infiltrating the multilayer structure with ceramic or metal, and heating the multilayer structure to remove the second polymer to form a photonic band gap structure.

Research Organization:
Iowa State Univ., Ames, IA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
W-7405-ENG-82
Assignee:
Iowa State University Research Foundation, Inc. (Ames, IA)
Patent Number(s):
6,555,406
Application Number:
10/081,729
OSTI ID:
1531455
Country of Publication:
United States
Language:
English

References (9)

Fabrication of three-dimensional micro-structures: Microtransfer molding journal October 1996
Hierarchically Ordered Oxides journal December 1998
Photonic band-gap structures journal January 1993
Laser Rapid Prototyping of Photonic Band-Gap Microstructures journal February 1997
Synthesis of Macroporous Minerals with Highly Ordered Three-Dimensional Arrays of Spheroidal Voids journal July 1998
Atom Lithography with a Holographic Light Mask journal February 2002
Layer-by-layer photonic crystals from microwave to far-infrared frequencies journal January 1996
Chalcogenide glass-based three-dimensional photonic crystals journal November 2000
Patterning Self-Assembled Monolayers: Applications in Materials Science journal May 1994

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