Method for fabricating precision focusing X-ray collimators
A method is provided for fabricating precision x-ray collimators including precision focusing x-ray collimators. Fabricating precision x-ray collimators includes the steps of using a substrate that is electrically conductive or coating a substrate with a layer of electrically conductive material, such as a metal. Then the substrate is coated with layer of x-ray resist. An intense radiation source, such as a synchrotron radiation source, is utilized for exposing the layer of x-ray resist with a pattern of x-ray. The pattern delineates a grid of apertures to collimate the x-rays. Exposed parts of the x-ray resist are removed. Regions of the removed x-ray resist are electroplated. Then remaining resist is optionally removed from the substrate. When exposing the layer of x-ray resist with a pattern of x-ray for non-focusing collimators, the substrate is maintained perpendicular to impinging x-rays from the synchrotron radiation source; and the substrate is scanned vertically. For precision focusing x-ray collimators, the substrate is scanned vertically in the z-direction while varying the angle of inclination of the substrate in a controlled way as a function of the position of the z-direction during the scan.
- Research Organization:
- Univ. of Chicago, IL (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-31-109-ENG-38
- Assignee:
- The University of Chicago (Chicago, IL)
- Patent Number(s):
- 6,459,771
- Application Number:
- 09/667,904
- OSTI ID:
- 1531447
- Resource Relation:
- Patent File Date: 2000-09-22
- Country of Publication:
- United States
- Language:
- English
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