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Dispersion and properties of zirconia suspensions for stereolithography

Journal Article · · International Journal of Applied Ceramic Technology
DOI:https://doi.org/10.1111/ijac.13321· OSTI ID:1531024
 [1];  [2];  [3];  [1];  [1];  [1];  [2]
  1. State Key Laboratory of High Performance Ceramics and Superfine Microstructure Shanghai Institute of Ceramics, Chinese Academy of Sciences Shanghai China, University of Chinese Academy of Sciences Beijing China
  2. State Key Laboratory of High Performance Ceramics and Superfine Microstructure Shanghai Institute of Ceramics, Chinese Academy of Sciences Shanghai China
  3. State Key Laboratory of High Performance Ceramics and Superfine Microstructure Shanghai Institute of Ceramics, Chinese Academy of Sciences Shanghai China, Suzhou Institute of SICCAS (Shanghai Institute of Ceramics, Chinese Academy of Sciences) Taicang China
Abstract

Stereolithography is an attractive technique for the fabrication of complex‐shaped ceramic components with high dimensional accuracy. One of the challenges in this technology is the development of high solid loading, low viscosity photosensitive ceramic suspension. In this study, the dispersion of zirconia in photocurable resin and the slurry properties were intensively investigated. Rheological measurements showed that DISPERBYK‐103 proved to be an effective dispersant. 42 vol% ZrO 2 suspension was successfully prepared using 3.5 wt% DISPERBYK‐103 as the dispersant, with a suitable viscosity (4.88 Pa·s) below the maximum allowable viscosity value (5 Pa·s) for stereolithography applications. The adsorption behavior of DISPERBYK‐103 on the surface of zirconia powders was characterized by TG and FT‐IR, confirming the dispersion effect of dispersant. Contact angle measurements were also conducted to show that the adsorption of DISPERBYK‐103 could help to improve the wettability between powder and photocurable resin. Results showed that DISPERBYK‐103 was effective for the preparation of suitable slurries for the development of ZrO 2 ceramics through stereolithography.

Sponsoring Organization:
USDOE
OSTI ID:
1531024
Journal Information:
International Journal of Applied Ceramic Technology, Journal Name: International Journal of Applied Ceramic Technology Journal Issue: 1 Vol. 17; ISSN 1546-542X
Publisher:
Wiley-BlackwellCopyright Statement
Country of Publication:
United States
Language:
English

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