SNS Josephson Junctions With Tunable Ta–N Barriers

Journal Article · Fri Mar 15 00:00:00 EDT 2019 · IEEE Transactions on Applied Superconductivity

DOI:https://doi.org/10.1109/TASC.2019.2904489· OSTI ID:1526219

Wolak, Matthaeus A.  ^[1]; Missert, Nancy A.  ^[1]; Henry, Michael David  ^[1]; Lewis, Rupert M.  ^[1]; Wolfley, Steve L.  ^[1]; Brunke, Lyle Brent ^[1]; Sierra Suarez, Jonatan A. ^[1]

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1. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

In this paper, we report on the fabrication and characterization of Nb/Ta-N/Nb Josephson junctions grown by room temperature magnetron sputtering on 150-mm diameter Si wafers. Junction characteristics depend upon the Ta-N barrier composition, which was varied by adjusting the N₂ flow during film deposition. Higher N₂ flow rates raise the barrier resistance and increase the junction critical current. This work demonstrates the viability of Ta-N as an alternative barrier to aluminum oxide, with the potential for large scale integration.

• Research Organization: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
• Sponsoring Organization: USDOE National Nuclear Security Administration (NNSA); Intelligence Advanced Research Projects Activity (IARPA)
• Grant/Contract Number: AC04-94AL85000; NA0003525
• OSTI ID: 1526219
• Report Number(s): SAND-2019-5786J; 675764
• Journal Information: IEEE Transactions on Applied Superconductivity, Vol. 29, Issue 5; ISSN 1051-8223
• Publisher: Institute of Electrical and Electronics Engineers (IEEE)
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
Nb
Ta–N
Josephson junctions
superconducting device fabrication