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Mass Enhancement of Two-Dimensional Electrons in Thin Oxide Si-MOSFETs

Journal Article · · Journal of Applied Physics
OSTI ID:1524

We report in this paper a study of the effective mass in thin oxide Si-MOSFETs, using the temperature dependence of the Shubnikov-de Haas (SdH) effect and following the methodology developed by Smith and Stiles.

Research Organization:
Sandia National Laboratories, Albuquerque, NM, and Livermore, CA
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
OSTI ID:
1524
Report Number(s):
SAND98-2450J; ON: DE00001524
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics
Country of Publication:
United States
Language:
English

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