Enhanced p-Type Doping in Polycrystalline CdTe Films: Deposition and Activation
- Univ. of Delaware, Newark, DE (United States)
- National Renewable Energy Lab. (NREL), Golden, CO (United States)
An in situ nonequilibrium method to increase hole density in polycrystalline CdTe thin films to 1016 cm-3 using group V substitution on Te is presented. Single-phase CdTe films doped with P, As, and Sb were deposited at 550 degrees C at 100-200 nm/s onto moving cadmium sulfide/high resistance transparent buffer layer/transparent conductive oxide /glass superstrates by vapor transport deposition in Cd overpressure from high purity compound sources. Doping levels before and after activation were determined by capacitance-voltage analysis of diagnostic devices. Secondary ion mass spectrometry depth profiling confirmed dopant incorporation levels of 1017 -1018 atoms/cm3 in as-deposited films. Electronic activation was carried out by post-deposition annealing in Cd or CdCl2 vapor with fast cooling, increasing acceptor concentrations to >1015 cm-3 for P and >1016 cm-3 for As and Sb, compared with mid -1014 cm-3 acceptor levels for undoped CdTe films. The activation methods are compatible with post-deposition processing presently used for high-efficiency CdTe solar cells. For the dopants As and Sb, the acceptor concentration increased by substitutional As Te and Sb Te formation, respectively, which was validated by cathodoluminescence spectroscopy.
- Research Organization:
- National Renewable Energy Lab. (NREL), Golden, CO (United States)
- Sponsoring Organization:
- USDOE Office of Energy Efficiency and Renewable Energy (EERE)
- Grant/Contract Number:
- AC36-08GO28308
- OSTI ID:
- 1514851
- Report Number(s):
- NREL/JA-5K00-73937
- Journal Information:
- IEEE Journal of Photovoltaics, Vol. 9, Issue 3; ISSN 2156-3381
- Publisher:
- IEEECopyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
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