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Title: Enhanced p-Type Doping in Polycrystalline CdTe Films: Deposition and Activation

Journal Article · · IEEE Journal of Photovoltaics

An in situ nonequilibrium method to increase hole density in polycrystalline CdTe thin films to 1016 cm-3 using group V substitution on Te is presented. Single-phase CdTe films doped with P, As, and Sb were deposited at 550 degrees C at 100-200 nm/s onto moving cadmium sulfide/high resistance transparent buffer layer/transparent conductive oxide /glass superstrates by vapor transport deposition in Cd overpressure from high purity compound sources. Doping levels before and after activation were determined by capacitance-voltage analysis of diagnostic devices. Secondary ion mass spectrometry depth profiling confirmed dopant incorporation levels of 1017 -1018 atoms/cm3 in as-deposited films. Electronic activation was carried out by post-deposition annealing in Cd or CdCl2 vapor with fast cooling, increasing acceptor concentrations to >1015 cm-3 for P and >1016 cm-3 for As and Sb, compared with mid -1014 cm-3 acceptor levels for undoped CdTe films. The activation methods are compatible with post-deposition processing presently used for high-efficiency CdTe solar cells. For the dopants As and Sb, the acceptor concentration increased by substitutional As Te and Sb Te formation, respectively, which was validated by cathodoluminescence spectroscopy.

Research Organization:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
Sponsoring Organization:
USDOE Office of Energy Efficiency and Renewable Energy (EERE)
Grant/Contract Number:
AC36-08GO28308
OSTI ID:
1514851
Report Number(s):
NREL/JA-5K00-73937
Journal Information:
IEEE Journal of Photovoltaics, Vol. 9, Issue 3; ISSN 2156-3381
Publisher:
IEEECopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 16 works
Citation information provided by
Web of Science

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