Depth-graded Mo/Si multilayer coatings for hard x-rays

Burcklen, Catherine; Pardini, Tom; Alameda, Jennifer; Robinson, Jeff; Platonov, Yuriy; Walton, Chris; Soufli, Regina

doi:10.1364/OE.27.007291

Title: Depth-graded Mo/Si multilayer coatings for hard x-rays

Journal Article · Wed Feb 27 00:00:00 EST 2019 · Optics Express

DOI:https://doi.org/10.1364/OE.27.007291· OSTI ID:1496913

Burcklen, Catherine; Pardini, Tom; Alameda, Jennifer; Robinson, Jeff; Platonov, Yuriy; Walton, Chris; Soufli, Regina

This manuscript presents the first systematic study of non-periodic, broadband Mo/Si multilayer coatings with and without B₄C interface barrier layers for hard x-ray applications with large field of view. The photon energy of operation in this work is 17.4 keV, the Mo Kα emission line. The coatings involve layers with varying thicknesses in the nanometer scale and the behavior at the layer interfaces plays a crucial role in their performance. Reflectivity measurements and modeling at 8.05 keV and 17.4 keV, Transmission Electron Microscopy (TEM), as well as thin film stress measurements, are employed to examine and optimize the reflective performance of these coatings and the physics of their constituent layers and interfaces. Mo/Si with B₄C barrier layers on the Mo-on-Si interface is shown to produce the highest reflectivity among all design configurations considered in this work.

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Research Organization:: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

Sponsoring Organization:: USDOE; LLNL Laboratory Directed Research and Development (LDRD) Program

Grant/Contract Number:: AC52-07NA27344

OSTI ID:: 1496913

Alternate ID(s):: OSTI ID: 1513155

Report Number(s):: LLNL-JRNL-760501; OPEXFF

Journal Information:: Optics Express, Journal Name: Optics Express Vol. 27 Journal Issue: 5; ISSN 1094-4087

Publisher:: Optical Society of AmericaCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 4 works

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