Effect of capping material on interfacial ferromagnetism in FeRh thin films

Baldasseroni, C.; Pálsson, G. K.; Bordel, C.; Valencia, S.; Unal, A. A.; Kronast, F.; Nemsak, S.; Fadley, C. S.; Borchers, J. A.; Maranville, B. B.; Hellman, F.

doi:10.1063/1.4862961

Title: Effect of capping material on interfacial ferromagnetism in FeRh thin films

Journal Article · Fri Jan 31 00:00:00 EST 2014 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4862961· OSTI ID:1511382

Baldasseroni, C. ^[1]; Pálsson, G. K. ^[2]; Bordel, C. ^[3]; Valencia, S. ^[4]; Unal, A. A. ^[4]; Kronast, F. ^[4]; Nemsak, S. ^[2]; Fadley, C. S. ^[2]; Borchers, J. A. ^[5]; Maranville, B. B. ^[5]; Hellman, F. ^[6]

Univ. of California, Berkeley, CA (United States)
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Univ. of California, Davis, CA (United States)
Univ. of California, Berkeley, CA (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Univ. de Rouen (France)
Helmholtz Zentrum-Berlin für Materialien und Energie GmbH (Germany)
National Inst. of Standards and Technology (NIST), Gaithersburg, MD (United States). Center for Neutron Research
Univ. of California, Berkeley, CA (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)

The role of the capping material in stabilizing a thin ferromagnetic layer at the interface between a FeRh film and cap in the nominally antiferromagnetic phase at room temperature was studied by x-ray magnetic circular dichroism in photoemission electron microscopy and polarized neutron reflectivity. These techniques were used to determine the presence or absence of interfacial ferromagnetism (FM) in films capped with different oxides and metals. Chemically stable oxide caps do not generate any interfacial FM while the effect of metallic caps depends on the element, showing that interfacial FM is due to metallic interdiffusion and the formation of a ternary alloy with a modified antiferromagnetic to ferromagnetic transition temperature.

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Research Organization:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22), Materials Sciences & Engineering Division (SC-22.2)

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 1511382

Journal Information:: Journal of Applied Physics, Vol. 115, Issue 4; ISSN 0021-8979

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 39 works

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