CO Displacement in an Oxidative Addition of Primary Silanes to Rhodium(I)
Journal Article
·
· Inorganic Chemistry
- Iowa State Univ., Ames, IA (United States); Ames Lab., Ames, IA (United States)
- Ames Lab. and Iowa State Univ., Ames, IA (United States)
The rhodium dicarbonyl {PhB(OxMe2)2ImMes}Rh(CO)2 (1) and primary silanes react by oxidative addition of a nonpolar Si–H bond and, uniquely, a thermal dissociation of CO. These reactions are reversible, and kinetic measurements model the approach to equilibrium. Thus, 1 and RSiH3 react by oxidative addition at room temperature in the dark, even in CO-saturated solutions. The oxidative addition reaction is first-order in both 1 and RSiH3, with rate constants for oxidative addition of PhSiH3 and PhSiD3 revealing kH/kD ~ 1. The reverse reaction, reductive elimination of Si–H from {PhB(OxMe2)2ImMes}RhH(SiH2R)CO (2), is also first-order in [2] and depends on [CO]. The equilibrium concentrations, determined over a 30 °C temperature range, provide ΔH° = –5.5 ± 0.2 kcal/mol and ΔS° = –16 ± 1 cal·mol–1K–1 (for 1 ⇌ 2). The rate laws and activation parameters for oxidative addition (ΔH‡ = 11 ± 1 kcal·mol–1 and ΔS‡ = –26 ± 3 cal·mol–1·K–1) and reductive elimination (ΔH‡ = 17 ± 1 kcal·mol–1 and ΔS‡ = –10 ± 3 cal·mol–1K–1), particularly the negative activation entropy for both forward and reverse reactions, suggest the transition state of the rate-determining step contains {PhB(OxMe2)2ImMes}Rh(CO)2 and RSiH3. Comparison of a series of primary silanes reveals that oxidative addition of arylsilanes is ca. 5× faster than alkylsilanes, whereas reductive elimination of Rh–Si/Rh–H from alkylsilyl and arylsilyl rhodium(III) occurs with similar rate constants. Furthermore, the equilibrium constant Ke for oxidative addition of arylsilanes is >1, whereas reductive elimination is favored for alkylsilanes.
- Research Organization:
- Ames Laboratory (AMES), Ames, IA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
- Grant/Contract Number:
- AC02-07CH11358
- OSTI ID:
- 1502873
- Report Number(s):
- IS-J--9829
- Journal Information:
- Inorganic Chemistry, Journal Name: Inorganic Chemistry Journal Issue: 6 Vol. 58; ISSN 0020-1669
- Publisher:
- American Chemical Society (ACS)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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