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Microstructure of Co-doped TiO₂ (110) Rutile by Ion Implantation

Journal Article · · Journal of Applied Physics, 97(7):99-104
DOI:https://doi.org/10.1063/1.1866482· OSTI ID:15020598
Co-doped rutile TiO₂ was synthesized by injecting Co ions into single crystal rutile TiO₂ using high energy ion implantation. Microstructures of the implanted specimens were studied in detail using high-resolution transmission electron microscopy (HRTEM), energy dispersive x-ray spectroscopy (EDS), electron diffraction, and HRTEM image simulations. The spatial distribution and conglomeration behavior of the implanted Co ions, as well as the point defect distributions induced by ion implantation, show strong dependences on implantation conditions. Uniform distribution of Co ions in the rutile TiO₂ lattice was obtained by implanting at 1075 K with a Co ion fluence of 1.25x10¹⁶ Co/cm². Implanting at 875 K leads to the formation of Co metal clusters. The precipitated Co metal clusters and surrounding TiO₂ matrix exhibit the orientation relationships Co<110>//TiO₂[001] and Co{111}//TiO₂(110). A structural model representing the interface between Co metal clusters and TiO₂ is developed based on HRTEM imaging and image simulations.
Research Organization:
Pacific Northwest National Laboratory (PNNL), Richland, WA (US), Environmental Molecular Sciences Laboratory (EMSL)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC05-76RL01830
OSTI ID:
15020598
Report Number(s):
PNNL-SA-42989; 11592; 400403809
Journal Information:
Journal of Applied Physics, 97(7):99-104, Journal Name: Journal of Applied Physics, 97(7):99-104 Journal Issue: 7 Vol. 97
Country of Publication:
United States
Language:
English

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