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Title: Progress in Silicon Heterojunction Devices by Hot-Wire CVD: Preprint

Conference ·
OSTI ID:15009888

We report on fabrication of silicon heterojunction (SHJ) solar cells based on Al-backed p-type silicon wafers, with hot-wire chemical vapor deposition (HWCVD) hydrogenated amorphous silicon (a-Si:H) emitter layers. The two-layer emitters are comprised of an extremely thin ({approx}5-nm) intrinsic a-Si:H (a-Si:H(i)) layer topped with a slightly thicker phosphorus-doped a Si:H layer (a-Si:H(n)). Open-circuit voltages (V{sub oc}) above 620 mV are routinely achieved with a maximum of over 640 mV, indicating effective passivation of the crystalline silicon (c-Si) surface by the thin a Si:H(i/n) stack. We used real-time spectroscopic ellipsometry (RTSE) as an in-situ diagnostic tool to monitor film thickness and roughness in real-time and to observe silicon crystallinity by further ex-situ data analysis. The deposited films were also examined by high-resolution transmission electron microscopy (HRTEM). Immediate a-Si:H deposition and a flat interface to the c-Si is the key factor in obtaining high V{sub oc}. On commercial p-type B-doped Czochralski silicon (CZ-Si) wafers with a polished surface and 2.1 {Omega}{center_dot}cm resistivity, the best efficiency obtained is 14.8%. Efficiency above 15.7% is achieved on a 1.3 {Omega}{center_dot}cm, p-type B-doped float-zone silicon (FZ-Si) wafer with a chemically polished front surface and a screen-printed Al-BSF.

Research Organization:
National Renewable Energy Lab., Golden, CO (US)
Sponsoring Organization:
US Department of Energy (US)
DOE Contract Number:
AC36-99-GO10337
OSTI ID:
15009888
Report Number(s):
NREL/CP-520-36668; TRN: US200430%%1571
Resource Relation:
Conference: Prepared for the 14th Workshop on Crystalline Silicon Solar Cells and Materials, Winter Park, CO (US), 08/08/2004--08/11/2004; Other Information: PBD: 1 Aug 2004
Country of Publication:
United States
Language:
English