PROBING SURFACE AND BULK CHEMISTRY IN RESIST FILMS USING NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURE

Journal Article · Tue Jan 01 00:00:00 EST 2002 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

DOI:https://doi.org/10.1116/1.1524970· OSTI ID:15008448

LENHART, J; JONES, R; LIN, E; SOLES, C; WU, W; SAMBASIVAN, S; GOLDFARB, D; ANGELOPOULOS, M

No abstract prepared.

• Research Organization: Brookhaven National Laboratory, National Synchrotron Light Source (US)
• Sponsoring Organization: DOE/OFFICE OF SCIENCE (US)
• DOE Contract Number: AC02-98CH10886
• OSTI ID: 15008448
• Report Number(s): BNL-72517-2004-JA; TRN: US200426%%492
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Vol. 20, Issue 6; Other Information: PBD: 1 Jan 2002
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
ABSORPTION SPECTROSCOPY
X-RAY SPECTROSCOPY
FINE STRUCTURE
SURFACE PROPERTIES
CHEMICAL COMPOSITION
MASKING
COVERINGS
FILMS
NATIONAL SYNCHROTRON LIGHT SOURCE