Interactions of Liquid and Vapor Water with Stoichiometric and Defective TiO2(100) Surfaces

Journal Article · Fri Oct 01 04:00:00 EDT 1999 · Surface Science

DOI:https://doi.org/10.1016/S0039-6028(99)00677-9· OSTI ID:15002696

Wang, Li-Qiong ^[1]; Ferris, Kim F ^[1]; Skiba, P X ^[2]; Shultz, Ashley N ^[3]; Baer, Donald R ^[1]; Engelhard, Mark H ^[1]

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1. BATTELLE (PACIFIC NW LAB)
2. Austin Peay State University
3. ASSOC WESTERN UNIVERSITY

Interactions of both liquids and vapor water with stoichiometric (nearly defect-free) and defective TiO2(100) surfaces have been studied using X-ray photoelectron spectroscopy (XPS) and ultraviolet photoemission spectroscopy (UPS). For an almost defect-free (100) 1X1 surface, water coverage was {approx}0.08ML (1 ML=7.36x10 4/cm2) at 10 4 L exposure to low-vapor-pressure water, {approx}0.32ML at 10 8 L exposure to higher-vapor-pressure water, and {approx}0.50 ML with liquid-water exposure, respectively. Defect intensities were greatly reduced after exposing defective surfaces to {approx}10 2 L low-vapor-pressure water. More significantly, electron-beam-induced defects were completely removed upon higher exposure (> 10 4 L), while defects created by Ar+ bombardment were partially removed. The surface structural influence on defect reactivity has been examined by comparing the results obtained from both (100) and (110) surfaces. Defects on (100) surfaces were removed more readily than those on (110) surfaces.

• Research Organization: Pacific Northwest National Lab., Richland, WA (US)
• Sponsoring Organization: US Department of Energy (US)
• DOE Contract Number: AC06-76RL01830
• OSTI ID: 15002696
• Report Number(s): PNNL-SA-32272; KC0201010
• Journal Information: Surface Science, Journal Name: Surface Science Journal Issue: 1-2 Vol. 440; ISSN SUSCAS; ISSN 0039-6028
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
DEFECTS
INTERACTIONS
REGENERATION
SURFACE DEFECTS
SURFACE PROPERTIES
TITANIUM OXIDE
TITANIUM OXIDES
WATER
WATER VAPOR
XPS