Nanoscale imaging of hydrogen and sodium in alteration layers of corroded glass using ToF-SIMS: Is an auxiliary sputtering ion beam necessary?

Zhang, Jiandong; Zhang, Yanyan; Collin, Marie; Gin, Stephane; Neeway, James J.; Wang, Tieshan; Zhu, Zihua

doi:10.1002/sia.6571

Nanoscale imaging of hydrogen and sodium in alteration layers of corroded glass using ToF-SIMS: Is an auxiliary sputtering ion beam necessary?

Journal Article · 11 October 2018 · Surface and Interface Analysis

DOI:https://doi.org/10.1002/sia.6571· OSTI ID:1496802

^[1]; ^[2]; Collin, Marie ^[3]; ^[3]; ^[4]; Wang, Tieshan ^[5]; ^[2]

School of Nuclear Science and Technology, Lanzhou University, Lanzhou Gansu 730000 China; W. R. Wiley Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland WA 99354 USA
W. R. Wiley Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland WA 99354 USA
CEA, DEN, DE2D, SEVT, F-30207 Bagnols-sur-Ceze France
Energy and Environment Directorate, Pacific Northwest National Laboratory, Richland WA 99354 USA
School of Nuclear Science and Technology, Lanzhou University, Lanzhou Gansu 730000 China

The hydrogen (H)/sodium (Na) interface is of great interest in glass corrosion research. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) is one of the few techniques that can provide nanoscale H and Na imaging simultaneously. However, the optimized condition for ToF-SIMS imaging of H in glass is still unclear. In H depth profiling using ToF-SIMS, H background control is a key, in which an analysis ion beam and a sputtering ion beam work together in an interlaced mode to minimize it. Therefore, it is of great interest to determine if an auxiliary sputtering ion beam is also necessary to control H background in ToF-SIMS imaging of H. In this study, a Bi+ primary ion beam with different auxiliary sputtering beams (Cs+, O2+ and Arn+) were compared on a corroded International Simple Glass (ISG). It was surprising that the H/Na interface could be directly imaged using positive ion imaging without any auxiliary sputtering ion beam under a vacuum of 2-3 × 10-8 mbar. The H+ background was about 5% atomic percent on the pristine ISG glass, which was significantly lower than the H concentration in the alteration layer (~15%). Moreover, positive ion imaging could show distributions of other interesting species simultaneously, providing more comprehensive information of the glass corrosion. The H+ background could be reduced with an auxiliary O2+ sputtering ion beam; however, significant loss of signal intensities was observed. In addition, a higher H background in ToF-SIMS imaging than that in the depth profiling was observed.

Research Organization:: Pacific Northwest National Lab. (PNNL), Richland, WA (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: AC05-76RL01830

OSTI ID:: 1496802

Report Number(s):: PNNL-SA-133548

Journal Information:: Surface and Interface Analysis, Vol. 51, Issue 2; ISSN 0142-2421

Publisher:: Wiley

Country of Publication:: United States

Language:: English

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