Degradation of ultra-thin boron films in air

Journal Article · Thu Apr 12 00:00:00 EDT 2018 · Applied Surface Science

DOI:https://doi.org/10.1016/j.apsusc.2018.04.126· OSTI ID:1488780

Bayu Aji, L. B. ^[1]; Baker, A. A. ^[1]; Bae, J. H. ^[1]; Hiszpanski, A. M. ^[1]; Stavrou, E. ^[1]; McCall, S. K. ^[1]; Kucheyev, S. O. ^[1]

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1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

Corrosion of B films in air can limit their practical applications. Here, we study the evolution of the elemental composition, thickness, and morphology of 10–100-nm-thick amorphous B films sputter-deposited onto glassy carbon substrates and stored under different conditions. Results show that films with thicknesses of ≳55 nm have expected excellent corrosion resistance during storage in laboratory air at room temperature over several months. In contrast, ≲45-nm-thick films exhibit pronounced degradation upon air exposure, starting with a change in the composition to ~30 and ~50 at.% of O and H, respectively. After such an O and H uptake, the degradation proceeds via mass loss with a characteristic time constant of ~5 days in air at room temperature. In conclusion, a post-deposition annealing at 1000 °C in an inert atmosphere makes all the films corrosion resistant.

• Research Organization: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE National Nuclear Security Administration (NNSA)
• Grant/Contract Number: AC52-07NA27344; 17-ERD-040
• OSTI ID: 1488780
• Alternate ID(s): OSTI ID: 1548500
• Report Number(s): LLNL-JRNL-744456; 898599
• Journal Information: Applied Surface Science, Vol. 448, Issue C; ISSN 0169-4332
• Publisher: Elsevier
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
Boron
Oxidation
Thin films
Rutherford backscattering spectroscopy
AFM