Silicon-Phosphorene Nanocavity-Enhanced Optical Emission at Telecommunications Wavelengths
- Argonne National Lab. (ANL), Argonne, IL (United States). Center for Nanoscale Materials
- Northwestern Univ., Evanston, IL (United States). Dept. of Materials Science and Engineering
- Centre National de la Recherche Scientifique (CNRS), Paris (France). Centre de Nanosciences et de Nanotechnologies
- Thales Research and Technology, Palaiseau (France)
- Thales Research and Technology, Palaiseau (France)
- Centre de Nanosciences et de Nanotechnologies, CNRS, Université Paris-Sud, Université Paris-Saclay, Bât. 220, 91405 Orsay cedex, France
Generating and amplifying light in silicon (Si) continues to attract significant attention due to the possibility of integrating optical and electronic components in a single material platform. Unfortunately, silicon is an indirect band gap material and therefore an inefficient emitter of light. With the rise of integrated photonics, the search for silicon-based light sources has evolved from a scientific quest to a major technological bottleneck for scalable, CMOS-compatible, light sources. Recently, emerging two-dimensional materials have opened the prospect of tailoring material properties based on atomic layers. Few-layer phosphorene, which is isolated through exfoliation from black phosphorus (BP), is a great candidate to partner with silicon due to its layer-tunable direct band gap in the near-infrared where silicon is transparent. Here we demonstrate a hybrid silicon optical emitter composed of few-layer phosphorene nanomaterial flakes coupled to silicon photonic crystal resonators. We show single-mode emission in the telecommunications band of 1.55 μm ($$E_g$$ = 0.8 eV) under continuous wave optical excitation at room temperature. The solution-processed few-layer BP flakes enable tunable emission across a broad range of wavelengths and the simultaneous creation of multiple devices. Our work highlights the versatility of the Si-BP material platform for creating optically active devices in integrated silicon chips.
- Research Organization:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- National Science Foundation (NSF); USDOE Office of Science (SC)
- Grant/Contract Number:
- AC02-06CH11357
- OSTI ID:
- 1487134
- Journal Information:
- Nano Letters, Vol. 18, Issue 10; ISSN 1530-6984
- Publisher:
- American Chemical SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
2D–Organic Hybrid Heterostructures for Optoelectronic Applications
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journal | February 2019 |
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