Nanosecond Melting and Recrystallization in Shock-Compressed Silicon
Journal Article
·
· Physical Review Letters
- Washington State Univ., Pullman, WA (United States). Inst. for Shock Physics
- Washington State Univ., Pullman, WA (United States). Inst. for Shock Physics. Dept. of Physics and Astronomy
In situ, time-resolved, x-ray diffraction and simultaneous continuum measurements were used to examine structural changes in Si shock compressed to 54 GPa. Shock melting was unambiguously established above ~31–33 GPa, through the vanishing of all sharp crystalline diffraction peaks and the emergence of a single broad diffraction ring. Reshock from the melt boundary results in rapid (nanosecond) recrystallization to the hexagonal-close-packed Si phase and further supports melting. Our results also provide new constraints on the high-temperature, high-pressure Si phase diagram.
- Research Organization:
- Washington State Univ., Pullman, WA (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC)
- Grant/Contract Number:
- NA0002442; NA0002007; AC02-06CH11357
- OSTI ID:
- 1476641
- Alternate ID(s):
- OSTI ID: 1473727; OSTI ID: 1476640
- Journal Information:
- Physical Review Letters, Vol. 121, Issue 13; ISSN 0031-9007
- Publisher:
- American Physical Society (APS)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 22 works
Citation information provided by
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