SiGe/Si electronics and optoelectronics

Journal Article · Sat May 01 04:00:00 EDT 1993 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

DOI:https://doi.org/10.1116/1.586832· OSTI ID:147083

Wang, K L; Karunasiri, R P.G. ^[1]

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1. Univ. of California, Los Angeles, CA (United States)

Recently, there is an increased interest in the use of SiGe layered material for integration with Si technology. SiGe offers the opportunity for the first time to realize the advantages of heterojunctions in Si-based technology. In this article, the present status of the SiGe epitaxial growth techniques will be discussed from the point of view of device application. New directions will be presented. Next, electronic devices to be reviewed include bipolars and field effect transistors. The progress of tunneling devices will also be discussed. Then, the realization of quantum wells and superlattices for optoelectronics will be discussed. Then, the realization of quantum wells and superlattices for optoelectronics will be discussed. These will include Si-based detectors and modulators based on interband and intersubband transitions. One of the focuses will be the normal incidence operation for intersubband devices. Finally, the current status in the quest of light emitters will be briefly addressed. 44 refs., 15 figs.

• OSTI ID: 147083
• Report Number(s): CONF-9210296--
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena Journal Issue: 3 Vol. 11; ISSN 0734-211X; ISSN JVTBD9
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CRYSTAL GROWTH METHODS
CRYSTAL LATTICES
FIELD EFFECT TRANSISTORS
GERMANIUM ALLOYS
HETEROJUNCTIONS
PHYSICAL PROPERTIES
SILICON ALLOYS
SUPERLATTICES