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Title: Two-dimensional stitching interferometry based on tilt measurement

Journal Article · · Optics Express
DOI:https://doi.org/10.1364/OE.26.023278· OSTI ID:1467135

In this study, a two-dimensional stitching interferometry system using two tiltmeters is proposed. During the scanning and the measurement, one tiltmeter stays with the interferometer and the other one is attached to the translation stage where the surface under test is placed. The differences of the x- and y-tilt readings between these two tiltmeters are recorded as the relative tilt between interferometer and surface under test. The relative tilt in both x- and y-directions are used to correct the surface tip/tilt of each subset, and then the piston is adjusted to get the final stitching surface map. As an example, a stitching result of a 125mm-long mirror surface is presented. The repeatability of our current stitching system is about 1.48 nm RMS. The stitching result is compared to the result of a one-dimensional angular-measurement-based stitching method to discuss the merits and limitation of the proposed method.

Research Organization:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
SC0012704
OSTI ID:
1467135
Alternate ID(s):
OSTI ID: 1478495
Report Number(s):
BNL-209305-2018-JAAM; OPEXFF
Journal Information:
Optics Express, Journal Name: Optics Express Vol. 26 Journal Issue: 18; ISSN 1094-4087
Publisher:
Optical Society of America (OSA)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 13 works
Citation information provided by
Web of Science

References (20)

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