Reversible Modification of the Structural and Electronic Properties of a Boron Nitride Monolayer by CO Intercalation

Ng, May Ling; Shavorskiy, Andrey; Rameshan, Christoph; Mikkelsen, Anders; Lundgren, Edvin; Preobrajenski, Alexei; Bluhm, Hendrik

doi:10.1002/cphc.201500031

Reversible Modification of the Structural and Electronic Properties of a Boron Nitride Monolayer by CO Intercalation

Journal Article · Tue Feb 24 23:00:00 EST 2015 · ChemPhysChem

DOI:https://doi.org/10.1002/cphc.201500031· OSTI ID:1464547

Ng, May Ling; Shavorskiy, Andrey; Rameshan, Christoph; Mikkelsen, Anders; Lundgren, Edvin; Preobrajenski, Alexei; Bluhm, Hendrik

Abstract

We demonstrate the reversible intercalation of CO between a hexagonal boron nitride (h‐BN) monolayer and a Rh(111) substrate above a threshold CO pressure of 0.01 mbar at room temperature. The intercalation of CO results in the flattening of the originally corrugated h‐BN nanomesh and an electronic decoupling of the BN layer from the Rh substrate. The intercalated CO molecules assume a coverage and adsorption site distribution comparable to that on the free Rh(111) surface at similar conditions. The pristine h‐BN nanomesh is reinstated upon heating to above 625 K. These observations may open up opportunities for a reversible tuning of the electronic and structural properties of monolayer BN films.

View Accepted Manuscript (Publisher)

Sponsoring Organization:: USDOE

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 1464547

Journal Information:: ChemPhysChem, Journal Name: ChemPhysChem Journal Issue: 5 Vol. 16; ISSN 1439-4235

Publisher:: Wiley Blackwell (John Wiley & Sons)Copyright Statement

Country of Publication:: Germany

Language:: English

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