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Title: Methods and systems for imaging bulk motional velocities in plasmas

Abstract

A method and apparatus for imaging the distribution of bulk motional velocities in plasmas such as inertial confinement fusion (ICF) implosions. This method and apparatus use multiple narrow-band x-ray crystal imaging systems, one or more of which have a bandpass tuned to lie within the Doppler-broadened emission line profile of a suitable plasma emission line. Crystals tuned on the one end of the profile will preferentially reflect x-rays from plasma ions moving towards the crystals, while crystals tuned to another end of the profile will preferentially reflect x-rays from plasma ions moving away from the crystals.

Inventors:
Publication Date:
Research Org.:
Mission Support and Tests Services, LLC, North Las Vegas, NV (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1462956
Patent Number(s):
10,018,577
Application Number:
15/090,408
Assignee:
Mission Support and Tests Services, LLC (North Las Vegas, NV)
DOE Contract Number:  
AC52-06NA25946
Resource Type:
Patent
Resource Relation:
Patent File Date: 2016 Apr 04
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY

Citation Formats

Koch, Jeffrey A. Methods and systems for imaging bulk motional velocities in plasmas. United States: N. p., 2018. Web.
Koch, Jeffrey A. Methods and systems for imaging bulk motional velocities in plasmas. United States.
Koch, Jeffrey A. Tue . "Methods and systems for imaging bulk motional velocities in plasmas". United States. https://www.osti.gov/servlets/purl/1462956.
@article{osti_1462956,
title = {Methods and systems for imaging bulk motional velocities in plasmas},
author = {Koch, Jeffrey A.},
abstractNote = {A method and apparatus for imaging the distribution of bulk motional velocities in plasmas such as inertial confinement fusion (ICF) implosions. This method and apparatus use multiple narrow-band x-ray crystal imaging systems, one or more of which have a bandpass tuned to lie within the Doppler-broadened emission line profile of a suitable plasma emission line. Crystals tuned on the one end of the profile will preferentially reflect x-rays from plasma ions moving towards the crystals, while crystals tuned to another end of the profile will preferentially reflect x-rays from plasma ions moving away from the crystals.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2018},
month = {7}
}

Patent:

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Works referenced in this record:

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