Modifying Surface Fluctuations of Polymer Melt Films with Substrate Modification

Zhou, Yang; He, Qiming; Zhang, Fan; Yang, Feipeng; Narayanan, Suresh; Yuan, Guangcui; Dhinojwala, Ali; Foster, Mark D.

doi:10.1021/acsmacrolett.7b00459

Title: Modifying Surface Fluctuations of Polymer Melt Films with Substrate Modification

Journal Article · Mon Aug 14 00:00:00 EDT 2017 · ACS Macro Letters

DOI:https://doi.org/10.1021/acsmacrolett.7b00459· OSTI ID:1439865

^[1]; He, Qiming ^[1]; Zhang, Fan ^[1]; Yang, Feipeng ^[1]; Narayanan, Suresh ^[2]; Yuan, Guangcui ^[3];

^[1];

^[1]

Univ. of Akron, OH (United States). Dept. of Polymer Science
Argonne National Lab. (ANL), Argonne, IL (United States). X-ray Science Division
National Inst. of Standards and Technology (NIST), Gaithersburg, MD (United States). Center for Neutron Research

Deposition of a plasma polymerized film on a silicon substrate substantially changes the fluctuations on the surface of a sufficiently thin, melt polystyrene (PS) film atop the substrate. Surface fluctuation relaxation times measured with X-ray photon correlation spectroscopy (XPCS) for ca. 4R_g thick melt films of 131 kg/mol linear PS on silicon and on a plasma polymer modified silicon wafer can both be described using a hydrodynamic continuum theory (HCT) that assumes the film is characterized throughout its depth by the bulk viscosity. However, when the film thickness is reduced to ~3R_g, confinement effects are evident. The surface fluctuations are slower than predicted using the HCT, and the confinement effect for the PS on silicon is larger than that for the PS on the plasma polymerized film. This deviation is thus due to a difference in the thicknesses of the strongly adsorbed layers at the substrate which are impacted by the substrate surface energy.

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Research Organization:: Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)

Sponsoring Organization:: USDOE Office of Science (SC); National Inst. of Standards and Technology (NIST), Gaithersburg, MD (United States); USDOC

Grant/Contract Number:: AC02-06CH11357; FA7000-14-2-20016; W911NF-09-1-0122

OSTI ID:: 1439865

Journal Information:: ACS Macro Letters, Vol. 6, Issue 9; ISSN 2161-1653

Publisher:: American Chemical Society (ACS)Copyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 10 works

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