Enhancing Molecular Alignment and Charge Transport of Solution-Sheared Semiconducting Polymer Films by the Electrical-Blade Effect
- Stanford Univ., CA (United States)
- Stanford Univ., CA (United States); SLAC National Accelerator Lab., Menlo Park, CA (United States)
- SLAC National Accelerator Lab., Menlo Park, CA (United States)
Controlling polymer chain alignment through processing is a means of tuning the charge transport of solution-based conjugated polymers. In this work, a processing strategy is proposed in which an external electric field (E-field) is applied to the coating blade (E-blade) to align polymer chain during solution-shearing, a meniscus-guided coating technique. A theoretical model based on dielectrophoresis quantitatively describes and predicts the alignment process and is used to guide the selection of the optimal conditions of the applied E-field. Using these conditions, more than two-fold increase in chain alignment is observed for E-bladed thin films of a diketopyrrolopyrrole (DPP) semiconducting polymer without affecting other morphological aspects such as film thickness, film coverage or fiber-like aggregation. Organic field effect transistors based on the E-bladed DPP polymer are fabricated at ambient conditions and over areas of a few cm2. They display a 3-fold improvement in their mobilities and a strong enhancement in charge transport anisotropy compared to films prepared without E-field. These results reveal a synergistic alignment effect from both the solution-shearing process and the applied E-field, and introduce a novel and general approach to control the morphology and the electrical properties of solutioncoated conjugated polymer thin films.
- Research Organization:
- SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States)
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- AC02-76SF00515; SC0016523
- OSTI ID:
- 1463390
- Alternate ID(s):
- OSTI ID: 1438076
- Journal Information:
- Advanced Electronic Materials, Journal Name: Advanced Electronic Materials Journal Issue: 7 Vol. 4; ISSN 2199-160X
- Publisher:
- WileyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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