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Semiconductor Heterojunctions for Enhanced Visible Light Photocatalytic H2 Production

Journal Article · · MRS Advances
DOI:https://doi.org/10.1557/adv.2018.370· OSTI ID:1435211
 [1];  [2];  [1]
  1. Wake Forest Univ., Winston-Salem, NC (United States). Dept. of Chemistry. Center for Energy, Environment and Sustainability (CEES)
  2. Wake Forest Univ., Winston-Salem, NC (United States). Center for Energy, Environment and Sustainability (CEES); Georgia Inst. of Technology, Atlanta, GA (United States). School of Chemistry and Biochemistry
Semiconductor-based heterojunctions have been shown to be effective photocatalytic materials to overcome the drawbacks of low photocatalytic efficiency that results from a high rate of electron-hole recombination and narrow photo-response range. In this study, we report on the study of heterojunctions made from visible light active, graphitic carbon nitride, g-C3N4), and UV light active, strontium pyroniobate, Sr2Nb2O7. Heterojunctions made from a combination of g-C3N4 and nitrogen-doped Sr2Nb2O7 obtained at different temperatures were also studied to determine the effect of N doping. The photocatalytic performance was evaluated by using photocatalytic hydrogen evolution reaction (HER)from water g under visible light irradiation. It was found that the photocatalytic activities of as prepared heterojunctions are significantly higher than that of individual components under similar conditions. Heterojunction formed from g-C3N4 and N-doped Sr2Nb2O7 at 700°C (CN/SNON-700) showed better performance than heterojunction made from g-C3N4 and Sr2Nb2O7 (CN/SNO). Finally, a plausible mechanism for the heterojunction enhanced photocatalytic activity is proposed based on, relative band positions, and photoluminescence data.
Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
National Science Foundation (NSF) (United States); USDOE; Wake Forest Univ. (United States)
Grant/Contract Number:
AC05-00OR22725
OSTI ID:
1435211
Journal Information:
MRS Advances, Journal Name: MRS Advances Journal Issue: 55 Vol. 3; ISSN 2059-8521
Publisher:
Materials Research Society (MRS)Copyright Statement
Country of Publication:
United States
Language:
English

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