Morphological instability of a planar oxide-alloy interface for inward oxide growth

Journal Article · Tue Feb 01 04:00:00 EST 1994 · Acta Metallurgica et Materialia

DOI:https://doi.org/10.1016/0956-7151(94)90512-6· OSTI ID:143158

Bobeth, M; Pompe, W; Rockstroh, M ^[1]; Schumann, E ^[2]

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1. Max-Planck-Gesellschaft, Dresden (Germany)
2. Inst. fur Werkstoffwissenschaft, Stuttgart (Germany)

The morphological stability of an oxide layer during selective oxidation of a binary alloy is investigated theoretically for the case of inward oxygen diffusion. According to the result of a linear stability analysis, a roughening of a planar oxide-metal interface can occur if interdiffusion in the alloy is rate determining. The wavelength of the most unstable mode is evaluated taking into account interface smoothing via volume and interface diffusion. For parabolic scale growth, the wavelength increases with time according to the power law t{sup 1/4} for volume diffusion and t{sup 1/6} for interface diffusion. The theoretical results are compared with recent experiments on the oxidation of {gamma}-Ni{sub 3}Al at low oxygen partial pressure smoothing of the interface in the course of further oxidation is interpreted as a transition from metal- to oxygen-diffusion controlled growth.

• OSTI ID: 143158
• Journal Information: Acta Metallurgica et Materialia, Journal Name: Acta Metallurgica et Materialia Journal Issue: 2 Vol. 42; ISSN 0956-7151; ISSN AMATEB
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM ALLOYS
INTERFACES
MORPHOLOGY
NICKEL ALLOYS
OXIDATION