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Plasma Parameters From Reentry Signal Attenuation

Journal Article · · IEEE Transactions on Plasma Science
 [1]
  1. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
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This study presents the application of a theoretically developed method that provides plasma parameter solution space information from measured RF attenuation that occurs during reentry. The purpose is to provide reentry plasma parameter information from the communication signal attenuation. The theoretical development centers around the attenuation and the complex index of refraction. The methodology uses an imaginary index of the refraction matching algorithm with a tolerance to find suitable solutions that satisfy the theory. The imaginary matching terms are then used to determine the real index of refraction resulting in the complex index of refraction. Then a filter is used to reject nonphysical solutions. Signal attenuation-based plasma parameter properties investigated include the complex index of refraction, plasma frequency, electron density, collision frequency, propagation constant, attenuation constant, phase constant, complex plasma conductivity, and electron mobility. RF plasma thickness attenuation is investigated and compared to the literature. Finally, similar plasma thickness for a specific signal attenuation can have different plasma properties.
Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
Grant/Contract Number:
AC04-94AL85000; NA0003525
OSTI ID:
1429753
Report Number(s):
SAND2017--3118J; 651984
Journal Information:
IEEE Transactions on Plasma Science, Journal Name: IEEE Transactions on Plasma Science Journal Issue: 3 Vol. 46; ISSN 0093-3813
Publisher:
IEEECopyright Statement
Country of Publication:
United States
Language:
English

Cited By (2)

Analysis and optimization of microwave reflections in a plasma-metal model journal April 2019
Study on propagation properties of electromagnetic waves through a magnetized, collisional and inhomogeneous plasma under oblique incidence journal August 2019

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Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
attenuation
electromagnetic propagation in plasma media
plasma properties
refraction