In situ characterization of the deposition of anatase TiO 2 on rutile TiO 2 (110)

Head, Ashley R.; Johansson, Niclas; Niu, Yuran; Snezhkova, Olesia; Chaudhary, Shilpi; Schnadt, Joachim; Bluhm, Hendrik; Chen, Chaoyu; Avila, José; Asensio, Maria-Carmen

doi:10.1116/1.5005533

Title: In situ characterization of the deposition of anatase TiO ₂ on rutile TiO ₂ (110)

Journal Article · Thu Mar 01 00:00:00 EST 2018 · Journal of Vacuum Science and Technology A

DOI:https://doi.org/10.1116/1.5005533· OSTI ID:1422846

Head, Ashley R.; Johansson, Niclas; Niu, Yuran ^[1]; Snezhkova, Olesia; Chaudhary, Shilpi; Schnadt, Joachim; Bluhm, Hendrik ^[2]; Chen, Chaoyu; Avila, José; Asensio, Maria-Carmen

MAX IV Laboratory, Lund University, Box 118, 22100 Lund, Sweden
Chemical Sciences Division and Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720

View Accepted Manuscript (Publisher)

Cite

Export

Save

Sponsoring Organization:: USDOE

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 1422846

Journal Information:: Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Vol. 36 Journal Issue: 2; ISSN 0734-2101

Publisher:: American Vacuum SocietyCopyright Statement

Country of Publication:: United States

Language:: English

Citation Metrics:

Cited by: 10 works

Citation information provided by
Web of Science

References (40)

Observation of a two-dimensional liquid of Fröhlich polarons at the bare SrTiO3 surface Chen, Chaoyu; Avila, José; Frantzeskakis, Emmanouil Nature Communications, Vol. 6, Issue 1 https://doi.org/10.1038/ncomms9585	journal	October 2015
LEED studies of surface imperfections Henzler, M. Applications of Surface Science, Vol. 11-12 https://doi.org/10.1016/0378-5963(82)90092-7	journal	July 1982
Photoelectron spectroscopy under ambient pressure and temperature conditions Frank Ogletree, D.; Bluhm, Hendrik; Hebenstreit, Eleonore D. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, Vol. 601, Issue 1-2 https://doi.org/10.1016/j.nima.2008.12.155	journal	March 2009
Selective Deposition of Dielectrics: Limits and Advantages of Alkanethiol Blocking Agents on Metal–Dielectric Patterns Minaye Hashemi, Fatemeh Sadat; Birchansky, Bradlee R.; Bent, Stacey F. ACS Applied Materials & Interfaces, Vol. 8, Issue 48 https://doi.org/10.1021/acsami.6b09960	journal	November 2016
Near Ambient Pressure X-ray Photoelectron Spectroscopy Study of the Atomic Layer Deposition of TiO ₂ on RuO ₂ (110) Head, Ashley R.; Chaudhary, Shilpi; Olivieri, Giorgia The Journal of Physical Chemistry C, Vol. 120, Issue 1 https://doi.org/10.1021/acs.jpcc.5b08699	journal	December 2015
Reaction Mechanism Studies on Titanium Isopropoxide–Water Atomic Layer Deposition Process Rahtu, A.; Ritala, M. Chemical Vapor Deposition, Vol. 8, Issue 1 https://doi.org/10.1002/1521-3862(20020116)8:1<21::AID-CVDE21>3.0.CO;2-0	journal	January 2002
Electronic structure of titania aerogels from soft x-ray absorption spectroscopy Kucheyev, S. O.; van Buuren, T.; Baumann, T. F. Physical Review B, Vol. 69, Issue 24 https://doi.org/10.1103/PhysRevB.69.245102	journal	June 2004
Atomic Layer Deposition of p-Type Epitaxial Thin Films of Undoped and N-Doped Anatase TiO ₂ Vasu, K.; Sreedhara, M. B.; Ghatak, J. ACS Applied Materials & Interfaces, Vol. 8, Issue 12 https://doi.org/10.1021/acsami.6b00628	journal	March 2016
Microscopic structure of the ${SiO}_{2}$ /Si interface Himpsel, F. J.; McFeely, F. R.; Taleb-Ibrahimi, A. Physical Review B, Vol. 38, Issue 9 https://doi.org/10.1103/PhysRevB.38.6084	journal	September 1988
Atomic Layer Deposition (ALD) of ZrO₂in Ultrahigh Vacuum (UHV) Roy, Probir Chandra; Jeong, Hyun Suck; Doh, Won Hui Bulletin of the Korean Chemical Society, Vol. 34, Issue 4 https://doi.org/10.5012/bkcs.2013.34.4.1221	journal	April 2013
Does Chemistry Really Matter in the Chemical Vapor Deposition of Titanium Dioxide? Precursor and Kinetic Effects on the Microstructure of Polycrystalline Films Taylor, Charles J.; Gilmer, David C.; Colombo, Daniel G. Journal of the American Chemical Society, Vol. 121, Issue 22 https://doi.org/10.1021/ja984446f	journal	June 1999
Real-Time Study of CVD Growth of Silicon Oxide on Rutile TiO₂(110) Using Tetraethyl Orthosilicate Chaudhary, Shilpi; Head, Ashley R.; Sánchez-de-Armas, Rocío The Journal of Physical Chemistry C, Vol. 119, Issue 33 https://doi.org/10.1021/acs.jpcc.5b04985	journal	August 2015
Shape-selective sieving layers on an oxide catalyst surface Canlas, Christian P.; Lu, Junling; Ray, Natalie A. Nature Chemistry, Vol. 4, Issue 12, p. 1030-1036 https://doi.org/10.1038/nchem.1477	journal	October 2012
The Nature of Water Nucleation Sites on TiO ₂ (110) Surfaces Revealed by Ambient Pressure X-ray Photoelectron Spectroscopy Ketteler, Guido; Yamamoto, Susumu; Bluhm, Hendrik The Journal of Physical Chemistry C, Vol. 111, Issue 23 https://doi.org/10.1021/jp068606i	journal	June 2007
Growth of epitaxial oxides on silicon using atomic layer deposition: Crystallization and annealing of TiO₂ on SrTiO₃-buffered Si(001) McDaniel, Martin D.; Posadas, Agham; Ngo, Thong Q. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 30, Issue 4 https://doi.org/10.1116/1.4734311	journal	July 2012
Solid phase epitaxial regrowth of (001) anatase titanium dioxide Barlaz, David Eitan; Seebauer, Edmund G. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 34, Issue 2 https://doi.org/10.1116/1.4941446	journal	March 2016
Homo-epitaxial growth of rutile TiO2 film on step and terrace structured substrate Yamamoto, Y.; Matsumoto, Y.; Koinuma, H. Applied Surface Science, Vol. 238, Issue 1-4 https://doi.org/10.1016/j.apsusc.2004.05.206	journal	November 2004
Probing the influence from residual Ti interstitials on water adsorption on TiO2(110) Walle, L. E.; Borg, A.; Uvdal, P. Physical Review B, Vol. 86, Issue 20 https://doi.org/10.1103/PhysRevB.86.205415	journal	November 2012
TiO2 chemical vapor deposition on Si(111) in ultrahigh vacuum: Transition from interfacial phase to crystalline phase in the reaction limited regime Karlsson, P. G.; Richter, J. H.; Andersson, M. P. Surface Science, Vol. 605, Issue 13-14 https://doi.org/10.1016/j.susc.2011.03.001	journal	July 2011
Growth and characterization of epitaxial anatase TiO2(001) on SrTiO3-buffered Si(001) using atomic layer deposition McDaniel, M. D.; Posadas, A.; Wang, T. Thin Solid Films, Vol. 520, Issue 21 https://doi.org/10.1016/j.tsf.2012.06.061	journal	August 2012
In-situ X-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of TiO₂ on Silicon Substrate Lee, Seung Youb; Jeon, Cheolho; Kim, Seok Hwan Japanese Journal of Applied Physics, Vol. 51, Issue 3R https://doi.org/10.1143/JJAP.51.031102	journal	February 2012
Templated Homoepitaxial Growth with Atomic Layer Deposition of Single-Crystal Anatase (101) and Rutile (110) TiO ₂ Kraus, Theodore J.; Nepomnyashchii, Alexander B.; Parkinson, B. A. ACS Applied Materials & Interfaces, Vol. 6, Issue 13 https://doi.org/10.1021/am5029507	journal	June 2014
Pulse laser deposition of epitaxial TiO 2 thin films for high-performance ultraviolet photodetectors Zhang, Zifeng; Wong, Lai Mun; Zhang, Zhiwei Applied Surface Science, Vol. 355 https://doi.org/10.1016/j.apsusc.2015.07.031	journal	November 2015
Growth of epitaxial anatase (001) and (101) films Herman, G. S.; Gao, Y. Thin Solid Films, Vol. 397, Issue 1-2 https://doi.org/10.1016/S0040-6090(01)01476-6	journal	October 2001
Low Temperature Chemical Vapor Deposition Using Atomic Layer Deposition Chemistry Reinke, Michael; Kuzminykh, Yury; Hoffmann, Patrik Chemistry of Materials, Vol. 27, Issue 5 https://doi.org/10.1021/cm504216p	journal	January 2015
Surface Kinetics of Titanium Isopropoxide in High Vacuum Chemical Vapor Deposition Reinke, Michael; Kuzminykh, Yury; Hoffmann, Patrik The Journal of Physical Chemistry C, Vol. 119, Issue 50 https://doi.org/10.1021/acs.jpcc.5b07177	journal	October 2015
A versatile instrument for ambient pressure x-ray photoelectron spectroscopy: The Lund cell approach Knudsen, Jan; Andersen, Jesper N.; Schnadt, Joachim Surface Science, Vol. 646 https://doi.org/10.1016/j.susc.2015.10.038	journal	April 2016
Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends Miikkulainen, Ville; Leskelä, Markku; Ritala, Mikko Journal of Applied Physics, Vol. 113, Issue 2, Article No. 021301 https://doi.org/10.1063/1.4757907	journal	January 2013
Soft X-ray microscopy and spectroscopy at the molecular environmental science beamline at the Advanced Light Source Bluhm, H.; Andersson, K.; Araki, T. Journal of Electron Spectroscopy and Related Phenomena, Vol. 150, Issue 2-3 https://doi.org/10.1016/j.elspec.2005.07.005	journal	February 2006
Selective-Area Atomic Layer Deposition Using Poly(methyl methacrylate) Films as Mask Layers Färm, Elina; Kemell, Marianna; Ritala, Mikko The Journal of Physical Chemistry C, Vol. 112, Issue 40 https://doi.org/10.1021/jp803872s	journal	September 2008
Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization Kraus, Theodore J.; Nepomnyashchii, Alexander B.; Parkinson, B. A. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 33, Issue 1 https://doi.org/10.1116/1.4902328	journal	January 2015
Nanoscale oxygen nonstoichiometry in epitaxial TiO₂ films grown by pulsed laser deposition Takata, Shintaro; Tanaka, Ryohei; Hachiya, Atsushi Journal of Applied Physics, Vol. 110, Issue 10 https://doi.org/10.1063/1.3662199	journal	November 2011
The surface science of titanium dioxide Diebold, Ulrike Surface Science Reports, Vol. 48, Issue 5-8 https://doi.org/10.1016/S0167-5729(02)00100-0	journal	January 2003
Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process Aarik, Jaan; Aidla, Aleks; Uustare, Teet Applied Surface Science, Vol. 161, Issue 3-4 https://doi.org/10.1016/S0169-4332(00)00274-9	journal	July 2000
Epitaxial TiO2/SnO2 core–shell heterostructure by atomic layer deposition Nie, Anmin; Liu, Jiabin; Li, Qianqian Journal of Materials Chemistry, Vol. 22, Issue 21 https://doi.org/10.1039/c2jm30690e	journal	January 2012
Alternative Low-Pressure Surface Chemistry of Titanium Tetraisopropoxide on Oxidized Molybdenum Johnson, Alexis M.; Stair, Peter C. The Journal of Physical Chemistry C, Vol. 118, Issue 50 https://doi.org/10.1021/jp505653u	journal	October 2014
Titanium Dioxide Nanomaterials: Self-Structural Modifications Liu, Lei; Chen, Xiaobo Chemical Reviews, Vol. 114, Issue 19 https://doi.org/10.1021/cr400624r	journal	May 2014
Sub-5 nm nanostructures fabricated by atomic layer deposition using a carbon nanotube template Woo, Ju Yeon; Han, Hyo; Kim, Ji Weon Nanotechnology, Vol. 27, Issue 26 https://doi.org/10.1088/0957-4484/27/26/265301	journal	May 2016
Transformation of the Crystalline Structure of an ALD TiO[sub 2] Film on a Ru Electrode by O[sub 3] Pretreatment Kim, Seong Keun; Hwang, Gyu Weon; Kim, Wan-Don Electrochemical and Solid-State Letters, Vol. 9, Issue 1 https://doi.org/10.1149/1.2131241	journal	January 2006
Atomic Layer Deposition of TiO ₂ on Mesoporous nanoITO: Conductive Core–Shell Photoanodes for Dye-Sensitized Solar Cells Alibabaei, Leila; Farnum, Byron H.; Kalanyan, Berç Nano Letters, Vol. 14, Issue 6 https://doi.org/10.1021/nl5006433	journal	May 2014

Similar Records

X-ray absorption and photoemission spectroscopy of zinc protoporphyrin adsorbed on rutile TiO{sub 2}(110) prepared by in situ electrospray deposition

Journal Article · Sun Feb 28 00:00:00 EST 2010 · Journal of Chemical Physics · OSTI ID:1422846

Rienzo, Anna; Mayor, Louise C; Magnano, Graziano; +5 more

Anatase and rutile TiO ₂ films deposited by arc-free deep oscillation magnetron sputtering

Journal Article · Fri Feb 01 00:00:00 EST 2013 · Journal of Physics. D, Applied Physics · OSTI ID:1422846

Lin, Jianliang; Wang, Bo; Sproul, William D.; +2 more

{alpha}- and {beta}-La{sub 4}Ti{sub 9}Si{sub 4}O{sub 30}. Synthesis and structure of the second member (m = 2) of novel layered oxosilicates containing (110) rutile sheets. Electrical property and band structure characterization of the mixed-valence titanium(III/IV) oxosilicate series, La{sub 4}Ti(Si{sub 2}O{sub 7}){sub 2}(TiO{sub 2}){sub 4m} (m = 1, 2)

Journal Article · Wed May 24 00:00:00 EDT 1995 · Journal of the American Chemical Society · OSTI ID:1422846

Wang, S; Hwu, S J; Paradis, J A; +1 more

Title: In situ characterization of the deposition of anatase TiO 2 on rutile TiO 2 (110)

Citation Formats

References (40)

Similar Records

Related Subjects

Title: In situ characterization of the deposition of anatase TiO ₂ on rutile TiO ₂ (110)