Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Comprehensive study of the electronic and optical behavior of highly degenerate p-type Mg-doped GaN and AlGaN

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4906464· OSTI ID:1421248

The bulk and 2-dimensional (2D) electrical transport properties of heavily Mg-doped p-type GaN films grown on AlN buffer layers by Metal Modulated Epitaxy are explored. Distinctions are made between three primary p-type conduction mechanisms: traditional valence band conduction, impurity band conduction, and 2D conduction within a 2D hole gas at a hetero-interface. The bulk and 2D contributions to the overall carrier transport are identified and the relative contributions are found to vary strongly with growth conditions. Films grown with III/V ratio less than 1.5 exhibit high hole concentrations exceeding 2 × 1019 cm−3 with effective acceptor activation energies of 51 meV. Films with III/V ratios greater than 1.5 exhibit lower overall hole concentrations and significant contributions from 2D transport at the hetero-interface. Films grown with III/V ratio of 1.2 and Mg concentrations exceeding 2 × 1020 cm−3 show no detectable inversion domains or Mg precipitation. Highly Mg-doped p-GaN and p-AlGaN with Al fractions up to 27% similarly exhibit hole concentrations exceeding 2 × 1019 cm−3. The p-GaN and p-Al0.11Ga0.89N films show broad ultraviolet (UV) photoluminescence peaks, which intercept the valence band, supporting the presence of a Mg acceptor band. Finally, a multi-quantum-well light-emitting diode (LED) and p-i-n diode are grown, both of which demonstrate rectifying behavior with turn-on voltages of 3–3.5 V and series resistances of 6–10 Ω without the need for any post-metallization annealing. The LED exhibits violet-blue luminescence at 425 nm, while the p-i-n diode shows UV luminescence at 381 nm, and both devices still show substantial light emission even when submerged in liquid nitrogen at 77 K.

Sponsoring Organization:
USDOE Advanced Research Projects Agency - Energy (ARPA-E)
Grant/Contract Number:
AR0000470
OSTI ID:
1421248
Alternate ID(s):
OSTI ID: 1211345
OSTI ID: 22413026
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 4 Vol. 117; ISSN 0021-8979
Publisher:
American Institute of PhysicsCopyright Statement
Country of Publication:
United States
Language:
English

References (58)

Closed-loop MBE growth of droplet-free GaN with very metal rich conditions using Metal Modulated Epitaxy with Mg and In journal May 2008
Extremely high hole concentrations in c-plane GaN journal February 2009
Polarization induced 2D hole gas in GaN/AlGaN heterostructures journal September 2001
The role of growth conditions on the p-doping of GaN by plasma-assisted molecular beam epitaxy journal December 2002
MOVPE growth and characterization of Mg-doped GaN journal December 1998
Polarity inversion of GaN(0001) by a high Mg doping journal September 2004
Mg doped GaN using a valved, thermally energetic source: enhanced incorporation, and control journal May 2005
MOCVD growth and electrical studies of p-type AlGaN with Al fraction 0.35 journal April 2006
Effect of growth conditions on electrical properties of Mg-doped p-GaN journal January 2007
Determination of two-dimensional electron and hole gas carriers in AlGaN/GaN/AlN heterostructures grown by Metal Organic Chemical Vapor Deposition journal February 2008
Observation of a two‐dimensional electron gas in low pressure metalorganic chemical vapor deposited GaN‐Al x Ga 1− x N heterojunctions journal June 1992
p ‐type conduction in Mg‐doped GaN and Al 0.08 Ga 0.92 N grown by metalorganic vapor phase epitaxy journal August 1994
Role of hydrogen in doping of GaN journal March 1996
Activation of acceptors in Mg‐doped GaN grown by metalorganic chemical vapor deposition journal January 1996
Critical thickness of GaN thin films on sapphire (0001) journal October 1996
Determination of wurtzite GaN lattice polarity based on surface reconstruction journal April 1998
Polarization-enhanced Mg doping of AlGaN/GaN superlattices journal October 1999
Mg-doped GaN: Similar defects in bulk crystals and layers grown on Al2O3 by metal–organic chemical-vapor deposition journal December 1999
Accumulation hole layer in p-GaN/AlGaN heterostructures journal May 2000
Control of GaN surface morphologies using plasma-assisted molecular beam epitaxy journal August 2000
Incorporation of Mg in GaN grown by plasma-assisted molecular beam epitaxy journal December 2000
Dynamically stable gallium surface coverages during plasma-assisted molecular-beam epitaxy of (0001) GaN journal January 2002
Light emission and microstructure of Mg-doped AlGaN grown on patterned sapphire journal January 2003
Enhanced p-type conduction in GaN and AlGaN by Mg-δ-doping journal May 2003
Efficient p-type doping of GaN films by plasma-assisted molecular beam epitaxy journal November 2004
Reproducible increased Mg incorporation and large hole concentration in GaN using metal modulated epitaxy journal July 2008
Metal modulation epitaxy growth for extremely high hole concentrations above 1019cm−3 in GaN journal October 2008
Transient atomic behavior and surface kinetics of GaN journal July 2009
Highly conductive modulation doped composition graded p-AlGaN/(AlN)/GaN multiheterostructures grown by metalorganic vapor phase epitaxy journal July 2009
Mg doping of GaN grown by plasma-assisted molecular beam epitaxy under nitrogen-rich conditions journal March 2010
Influence of Ga/N ratio on morphology, vacancies, and electrical transport in GaN grown by molecular beam epitaxy at high temperature journal November 2010
Passivation and activation of Mg acceptors in heavily doped GaN journal August 2011
Elastic strain relaxation and piezoeffect in GaN-AlN, GaN-AlGaN and GaN-InGaN superlattices journal May 1997
Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures journal March 1999
Heavy doping effects in Mg-doped GaN journal February 2000
Negligible carrier freeze-out facilitated by impurity band conduction in highly p-type GaN journal August 2012
Tunnel-injection quantum dot deep-ultraviolet light-emitting diodes with polarization-induced doping in III-nitride heterostructures journal January 2014
Structure of GaN(0001): The laterally contracted Ga bilayer model journal April 2000
Hole conductivity and compensation in epitaxial GaN:Mg layers journal October 2000
Surfactant effect of gallium during molecular-beam epitaxy of GaN on AlN (0001) journal October 2001
Gallium adsorption on (0001) GaN surfaces journal April 2003
Energetics of Mg incorporation at GaN(0001) and Ga N ( 000 1 ¯ ) surfaces journal April 2006
P-Channel InGaN-HFET Structure Based on Polarization Doping journal July 2004
MBE-Regrown Ohmics in InAlN HEMTs With a Regrowth Interface Resistance of 0.05 $\Omega\cdot\hbox{mm}$ journal April 2012
Polarization-Induced GaN-on-Insulator E/D Mode p-Channel Heterostructure FETs journal July 2013
Role of low-temperature (200 °C) nitridation in the growth of GaN by plasma-assisted molecular-beam epitaxy
  • Namkoong, Gon; Doolittle, W. Alan; Brown, April S.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 20, Issue 3 https://doi.org/10.1116/1.1470514
journal January 2002
Polarity control during molecular beam epitaxy growth of Mg-doped GaN
  • Green, D. S.; Haus, E.; Wu, F.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, Issue 4 https://doi.org/10.1116/1.1589511
journal January 2003
In situ growth regime characterization of AlN using reflection high energy electron diffraction
  • Burnham, Shawn D.; Alan Doolittle, W.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 24, Issue 4 https://doi.org/10.1116/1.2219757
journal January 2006
Reproducible reflection high energy electron diffraction signatures for improvement of AlN using in situ growth regime characterization
  • Burnham, Shawn D.; Namkoong, Gon; Lee, Kyoung-Keun
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 25, Issue 3 https://doi.org/10.1116/1.2737435
journal January 2007
Polarization-Induced Hole Doping in Wide-Band-Gap Uniaxial Semiconductor Heterostructures journal December 2009
Evidence of Two-Dimensional Hole Gas in p-Type AlGaN/AlN/GaN Heterostructures journal November 2009
High Density Two-Dimensional Hole Gas Induced by Negative Polarization at GaN/AlGaN Heterointerface journal December 2010
P-Type Conduction in Mg-Doped GaN Treated with Low-Energy Electron Beam Irradiation (LEEBI) journal December 1989
Highly P-Typed Mg-Doped GaN Films Grown with GaN Buffer Layers journal October 1991
Thermal Annealing Effects on P-Type Mg-Doped GaN Films journal February 1992
Theory of Point Defects and Complexes in GaN journal January 1995
Non-Equilibrium Acceptor Concentration in GaN:Mg Grown by Metalorganic Chemical Vapor Deposition journal January 2003
Mg Doped GaN Using a Valved, Thermally Energetic Source: Enhanced Incorporation, Control and Quantitative Optimization journal January 2003

Similar Records

Comprehensive study of the electronic and optical behavior of highly degenerate p-type Mg-doped GaN and AlGaN
Journal Article · Tue Jan 27 23:00:00 EST 2015 · Journal of Applied Physics · OSTI ID:1211345

Comprehensive study of the electronic and optical behavior of highly degenerate p-type Mg-doped GaN and AlGaN
Journal Article · Tue Jan 27 23:00:00 EST 2015 · Journal of Applied Physics · OSTI ID:22413026

Nonpolar a-plane p-type GaN and p-n Junction Diodes
Journal Article · Fri Oct 15 00:00:00 EDT 2004 · Journal of Applied Physics · OSTI ID:20662118

Related Subjects