Stability of Adsorbed Polystyrene Nanolayers on Silicon Substrates

Jiang, Naisheng; Cheung, JustinM.; Guo, Yichen; Endoh, Maya K.; Koga, Tadanori; Yuan, Guangcui; Satija, Sushil K.

doi:10.1002/macp.201700326

Title: Stability of Adsorbed Polystyrene Nanolayers on Silicon Substrates

Journal Article · Thu Sep 28 00:00:00 EDT 2017 · Macromolecular Chemistry and Physics

DOI:https://doi.org/10.1002/macp.201700326· OSTI ID:1419604

Jiang, Naisheng ^[1]; Cheung, JustinM. ^[1]; Guo, Yichen ^[1]; Endoh, Maya K. ^[1];

^[2]; Yuan, Guangcui ^[3]; Satija, Sushil K. ^[3]

Department of Materials Science and Chemical Engineering Stony Brook University Stony Brook NY 11794‐2275 USA
Department of Materials Science and Chemical Engineering Stony Brook University Stony Brook NY 11794‐2275 USA, Department of Chemistry Stony Brook University Stony Brook NY 11794‐3400 USA
Center for Neutron Research National Institute of Standards and Technology Gaithersburg MD 20899 USA

Abstract The solid–polymer melt interface is of great scientific interest due to its vital importance in governing a wide array of physical and mechanical properties of polymer thin films. Recent studies have elucidated the coexistence of two different chain conformations of polymer chains adsorbed on a solid (i.e., loosely adsorbed chains and flattened chains). In this work, film stabilities of the polystyrene (PS) “interfacial sublayer” (composed of outer loosely adsorbed chains and inner flattened chains) and flattened layer (composed of the lone flattened chains) prepared on silicon (Si) substrates are investigated. The atomic force microscopy studies reveal that the as‐rinsed PS flattened layer is subjected to spinodal‐like dewetting during a post‐thermal annealing process even at temperatures below the bulk glass transition temperature. Furthermore, it is found that the surface morphology of the flattened layer can be reversibly changed from a homogeneous pattern under good solvent conditions to spinodal‐like droplets under poor solvent conditions. By contrast, it is found that the PS interfacial sublayer remains stable under both good and poor solvent conditions. These findings illuminate the role which density variations within the adsorbed layers play in the mechanism behind the wetting‐dewetting transition.

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Sponsoring Organization:: USDOE

Grant/Contract Number:: DE‐AC02‐98CH10886

OSTI ID:: 1419604

Journal Information:: Macromolecular Chemistry and Physics, Journal Name: Macromolecular Chemistry and Physics Vol. 219 Journal Issue: 3; ISSN 1022-1352

Publisher:: Wiley Blackwell (John Wiley & Sons)Copyright Statement

Country of Publication:: Germany

Language:: English

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Cited by: 21 works

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