The thermal stability of photoacid generators in phenolic matrices
- Shipley Co. Inc., Marlboro, MA (United States)
The thermal stability of various photolabile sulfonate esters in phenolic matrices have been investigated by differential scanning calorimetry and thermogravimetric analysis. It was observed that the thermal stability of these photoacid generators is lowered in the presence of phenolic groups. As a result acid can be thermally generated, thereby reducing the selectivity of photoacid generation. The sulfonate esters investigated in phenolic matrices included nitrobenzyl tosylates, imino sulfonates, benzoin tosylate and 1,2,3-tris(methanesulfonyloxy)benzene. Also the effect of the thermal generation of acid from these photoacid generators on the temperature and rate of deprotection of partially t-butoxycarbonate blocked poly (vinylphenol) was studied by thermogravimetric analysis and FTIR.
- OSTI ID:
- 141814
- Report Number(s):
- CONF-930304-; TRN: 93:003688-1501
- Resource Relation:
- Conference: 205. American Chemical Society national meeting, Denver, CO (United States), 28 Mar - 2 Apr 1993; Other Information: PBD: 1993; Related Information: Is Part Of 205th ACS national meeting; PB: 1951 p.
- Country of Publication:
- United States
- Language:
- English
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