skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: A finite element procedure for radio-frequency sheath–plasma interactions based on a sheath impedance model

Abstract

A finite element code that solves self-consistent radio-frequency (RF) sheath-plasma interaction problems is improved by incorporating a generalized sheath boundary condition in the macroscopic solution scheme. This sheath boundary condition makes use of a complex sheath impedance including both the sheath capacitance and resistance, which enables evaluation of not only the RF voltage across the sheath but also the power dissipation in the sheath. The newly developed finite element procedure is applied to cases where the background magnetic field is perpendicular to the sheath surface in one- and two-dimensional domains filled by uniform low- and high-density plasmas. The numerical results are compared with those obtained by employing the previous capacitive sheath model at a typical frequency for ion cyclotron heating used in fusion experiments. It is shown that for sheaths on the order of 100 V in a high-density plasma, localized RF power deposition can reach a level which causes material damage. It is also shown that the sheath-plasma wave resonances predicted by the capacitive sheath model do not occur when parameters are such that the generalized sheath impedance model substantially modifies the capacitive character of the sheath. Here, possible explanations for the difference in the maximum RF sheath voltagemore » depending on the plasma density are also discussed.« less

Authors:
 [1];  [2]
  1. Kyushu Institute of Technology, Fukuoka (Japan)
  2. Lodestar Research Corp., Boulder, CO (United States)
Publication Date:
Research Org.:
Lodestar Research Corp., Boulder, CO (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Fusion Energy Sciences (FES) (SC-24)
OSTI Identifier:
1395550
Report Number(s):
DOE-ER/54823-21; LRC-17-172
Journal ID: ISSN 0010-4655; PII: S0010465517302072; TRN: US1702241
Grant/Contract Number:  
FC02-05ER54823
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Computer Physics Communications
Additional Journal Information:
Journal Volume: 220; Journal Issue: C; Related Information: http://dx.doi.org/10.1016/j.cpc.2017.06.025; Journal ID: ISSN 0010-4655
Publisher:
Elsevier
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; radio-frequency sheaths; magnetic confinement fusion; finite-element-method; plasma waves; plasma-surface interactions; cold plasma

Citation Formats

Kohno, H., and Myra, J. R. A finite element procedure for radio-frequency sheath–plasma interactions based on a sheath impedance model. United States: N. p., 2017. Web. doi:10.1016/j.cpc.2017.06.025.
Kohno, H., & Myra, J. R. A finite element procedure for radio-frequency sheath–plasma interactions based on a sheath impedance model. United States. doi:10.1016/j.cpc.2017.06.025.
Kohno, H., and Myra, J. R. Mon . "A finite element procedure for radio-frequency sheath–plasma interactions based on a sheath impedance model". United States. doi:10.1016/j.cpc.2017.06.025. https://www.osti.gov/servlets/purl/1395550.
@article{osti_1395550,
title = {A finite element procedure for radio-frequency sheath–plasma interactions based on a sheath impedance model},
author = {Kohno, H. and Myra, J. R.},
abstractNote = {A finite element code that solves self-consistent radio-frequency (RF) sheath-plasma interaction problems is improved by incorporating a generalized sheath boundary condition in the macroscopic solution scheme. This sheath boundary condition makes use of a complex sheath impedance including both the sheath capacitance and resistance, which enables evaluation of not only the RF voltage across the sheath but also the power dissipation in the sheath. The newly developed finite element procedure is applied to cases where the background magnetic field is perpendicular to the sheath surface in one- and two-dimensional domains filled by uniform low- and high-density plasmas. The numerical results are compared with those obtained by employing the previous capacitive sheath model at a typical frequency for ion cyclotron heating used in fusion experiments. It is shown that for sheaths on the order of 100 V in a high-density plasma, localized RF power deposition can reach a level which causes material damage. It is also shown that the sheath-plasma wave resonances predicted by the capacitive sheath model do not occur when parameters are such that the generalized sheath impedance model substantially modifies the capacitive character of the sheath. Here, possible explanations for the difference in the maximum RF sheath voltage depending on the plasma density are also discussed.},
doi = {10.1016/j.cpc.2017.06.025},
journal = {Computer Physics Communications},
number = C,
volume = 220,
place = {United States},
year = {Mon Jul 24 00:00:00 EDT 2017},
month = {Mon Jul 24 00:00:00 EDT 2017}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record

Citation Metrics:
Cited by: 1 work
Citation information provided by
Web of Science

Save / Share: